693.932 PEOPLE
| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Blanquet, Elisabeth
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (23/23 displayed)
- 2024Integration of epitaxial LiNbO3 thin films with silicon technologycitations
- 2024Silver nanowire networks coated with a few nanometer thick aluminum nitride films for ultra-transparent and robust heating applicationscitations
- 2024MoS2-assisted growth of highly-oriented AlN thin films by low-temperature van der Waals epitaxycitations
- 2022Green upconversion improvement of TiO2 codoped Er3+-Yb3+ nanoparticles based thin film by adding ALD-Al2O3 for silicon solar cell applicationscitations
- 2022Ti3SiC2-SiC multilayer thin films deposited by high temperature reactive chemical vapor depositioncitations
- 2022Ti3SiC2-SiC multilayer thin films deposited by high temperature reactive chemical vapor depositioncitations
- 2021Asymmetry-Induced Redistribution in Sn(IV)–Ti(IV) Hetero-Bimetallic Alkoxide Precursors and Its Impact on Thin-Film Deposition by Metal–Organic Chemical Vapor Depositioncitations
- 2020Synthesis of upconversion TiO2:Er3+-Yb3+ nanoparticles and deposition of thin films by spin coating techniquecitations
- 2020Improved critical temperature of superconducting plasma-enhanced atomic layer deposition of niobium nitride thin films by thermal annealingcitations
- 2019Ti-Al-N-Based Hard Coatings: Thermodynamical Background, CVD Deposition, and Properties. A Reviewcitations
- 2019Chemical vapor deposition of titanium nitride thin films: kinetics and experimentscitations
- 2019High temperature chemical vapor deposition of aluminum nitride thin films and coatings: properties and applications
- 2018Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
- 2018The initial stages of ZnO atomic layer deposition on atomically flat In$_{0.53}$Ga$_{0.47}$As substratescitations
- 2016Al2O3 thin films deposited by thermal atomic layer deposition: Characterization for photovoltaic applicationscitations
- 2016Al2O3 thin films deposited by thermal atomic layer deposition: Characterization for photovoltaic applicationscitations
- 2016Growth of boron nitride films on w-AlN (0001), 4° off-cut 4H-SiC (0001), W (110) and Cr (110) substrates by Chemical Vapor Depositioncitations
- 2014Niobium nitride thin films deposited by high temperature chemical vapor depositioncitations
- 2011Plasma Enhanced Atomic Layer Deposition of ZrO 2 : A Thermodynamic Approachcitations
- 2009ESD and ALD Depositions of Ta 2 O 5 Thin Films Investigated as Barriers to Copper Diffusion for Advanced Metallizationcitations
- 2007Elaboration of Ta 2 O 5 Thin Films Using Electrostatic Spray Deposition for Microelectronic Applicationscitations
- 2006Plasma etching of HfO 2 at elevated temperatures in chlorine-based chemistrycitations
- 2006Processing of Poly-SiC Substrates with Large Grains for Wafer-Bondingcitations
Places of action
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