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Naji, M. |
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Motta, Antonella |
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Aletan, Dirar |
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Mohamed, Tarek |
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Ertürk, Emre |
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Taccardi, Nicola |
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Kononenko, Denys |
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Petrov, R. H. | Madrid |
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Alshaaer, Mazen | Brussels |
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Bih, L. |
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Casati, R. |
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Muller, Hermance |
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Kočí, Jan | Prague |
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Šuljagić, Marija |
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Kalteremidou, Kalliopi-Artemi | Brussels |
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Azam, Siraj |
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Ospanova, Alyiya |
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Blanpain, Bart |
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Ali, M. A. |
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Popa, V. |
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Rančić, M. |
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Ollier, Nadège |
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Azevedo, Nuno Monteiro |
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Landes, Michael |
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Rignanese, Gian-Marco |
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Pons, Michel
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (13/13 displayed)
- 2019Chemical vapor deposition of titanium nitride thin films: kinetics and experimentscitations
- 2019High temperature properties of AlN coatings deposited by chemical vapor deposition for solar central receiverscitations
- 2019Multilayer multifunctional advanced coatings for receivers of concentrated solar power plantscitations
- 2019High temperature chemical vapor deposition of aluminum nitride thin films and coatings: properties and applications
- 2019Scale up of a DLI-MOCVD process for the internal treatment of a batch of 16 nuclear fuel cladding segments with a CrCx protective coatingcitations
- 2018High-temperature oxidation resistance of chromium-based coatings deposited by DLI-MOCVD for enhanced protection of the inner surface of long tubescitations
- 2018High-temperature oxidation resistance of chromium-based coatings deposited by DLI-MOCVD for enhanced protection of the inner surface of long tubescitations
- 2018Chromium carbide growth by direct liquid injection chemical vapor deposition in long and narrow tubes, experiments, modeling and simulationcitations
- 2018Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
- 2017Chromium carbide growth at low temperature by a highly efficient DLI-MOCVD process in effluent recycling modecitations
- 2017Evidence for a Cr metastable phase as a tracer in DLI-MOCVD chromium hard coatings usable in high temperature environmentcitations
- 2016Growth of boron nitride films on w-AlN (0001), 4° off-cut 4H-SiC (0001), W (110) and Cr (110) substrates by Chemical Vapor Depositioncitations
- 2006Processing of Poly-SiC Substrates with Large Grains for Wafer-Bondingcitations
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