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Naji, M. |
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Motta, Antonella |
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Aletan, Dirar |
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Mohamed, Tarek |
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Ertürk, Emre |
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Taccardi, Nicola |
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Kononenko, Denys |
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Petrov, R. H. | Madrid |
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Alshaaer, Mazen | Brussels |
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Bih, L. |
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Casati, R. |
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Muller, Hermance |
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Kočí, Jan | Prague |
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Šuljagić, Marija |
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Kalteremidou, Kalliopi-Artemi | Brussels |
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Azam, Siraj |
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Ospanova, Alyiya |
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Blanpain, Bart |
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Ali, M. A. |
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Popa, V. |
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Rančić, M. |
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Ollier, Nadège |
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Azevedo, Nuno Monteiro |
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Landes, Michael |
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Rignanese, Gian-Marco |
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Blanquet, E.
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (27/27 displayed)
- 2023Chemical conversion of MoS2 thin films deposited by atomic layer deposition (ALD) into molybdenum nitride monitored by in situ reflectance measurements
- 2022Growth of polycrystalline SiC thin films by chemical vapor deposition for brain implanted electrodes
- 2021Coupling powder bed additive manufacturing and vapor phase deposition methods for elaboration of coated 3D Ti-6Al-4V architectures with enhanced surface propertiescitations
- 2021Biomass pyrolysis coupled with non-thermal plasma/catalysis for hydrogen production: Influence of biomass components and catalyst properties
- 2019Superconducting properties of NbN thin films deposited by plasma enhanced atomic layer deposition using a metalorganic precursor
- 2018Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer depositioncitations
- 2018Superconducting properties of NbTiN thin films deposited by high-temperature chemical vapor depositioncitations
- 2018Reactive chemical vapor deposition of heteroepitaxial Ti1-xAlxN filmscitations
- 2016Superconducting properties of very high quality NbN thin films grown by high temperature chemical vapor depositioncitations
- 2015Undoped TiO2 and nitrogen-doped TiO2 thin films deposited by atomic layer deposition on planar and architectured surfaces for photovoltaic applicationscitations
- 2015Superconducting properties of NbN thin films deposited by plasma enhanced atomic layer deposition using a metalorganic precursor
- 2014Influence of the V/III ratio in the gas phase on thin epitaxial AlN layers grown on (0001) sapphire by high temperature hydride vapor phase epitaxycitations
- 2014Influence of the V/III ratio in the gas phase on thin epitaxial AlN layers grown on (0001) sapphire by high temperature hydride vapor phase epitaxycitations
- 2013CFD modeling of the high-temperature HVPE growth of aluminum nitride layers on c-plane sapphire: from theoretical chemistry to process evaluationcitations
- 2013Effects of the V/III ratio on the quality of aluminum nitride grown on (0001) sapphire by high temperature hydride vapor phase epitaxycitations
- 2013High temperature chemical vapor deposition of aluminum nitride, growth and evaluationcitations
- 2013High temperature chemical vapor deposition of aluminum nitride, growth and evaluationcitations
- 2012Preferential orientation of fluorine-doped SnO2 thin films: The effects of growth temperature.citations
- 2011Developments of TaN ALD Process for 3D Conformal Coatings
- 2010High temperature chemical vapor deposition of AlN/W1−xRex coatings on bulk SiC
- 2010High temperature chemical vapor deposition of AlN/W1−xRex coatings on bulk SiCcitations
- 2010Chemical vapour deposition and atomic layer deposition of amorphous and nanocrystalline metallic coatings: Towards deposition of multimetallic filmscitations
- 2009Influence of total pressure and precursors flow rates on the growth of aluminum nitride by high temperature chemical vapor deposition (HTCVD)
- 2009The ways to deposit amorphous or nanocrystalline material from a vapor phase
- 2009Thermodynamic and experimental investigations on the growth of thick aluminum nitride layers by high temperature CVDcitations
- 2009Thermodynamic and experimental study of UC powders ignition.citations
- 2006High temperature silicon carbide chemical vapor deposition processes: From pure thermodynamic to mass transport modeling
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