693.932 PEOPLE
| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Patscheider, Jörg
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (25/25 displayed)
- 2022Conductive n-type gallium nitride thin films prepared by sputter depositioncitations
- 2022Wear Study of a Magnetron-Sputtered TiC/a-C Nanocomposite Coating under Media-Lubricated Oscillating Sliding Conditionscitations
- 2021Synthesis and characterisation of nanocomposite Mo-Fe-B thin films deposited by magnetron sputteringcitations
- 2019A setup for arc-free reactive DC sputter deposition of Al-O-Ncitations
- 2018Spectral artefacts post sputter-etching and how to cope with them – a case study of XPS on nitride-based coatings using monoatomic and cluster ion beamscitations
- 2016Structure and properties of sputter-deposited Al-Sn-N thin filmscitations
- 2015AlN/Si 3 N 4 multilayers as an interface model system for Al 1 − x Si x N/Si 3 N 4 nanocomposite thin filmscitations
- 2013Facile diameter control of vertically aligned, narrow single-walled carbon nanotubescitations
- 2013Comparison of Al-Si-N nanocomposite coatings deposited by HIPIMS and DC magnetron sputteringcitations
- 2012The Si 3 N 4 /TiN interface: 3. Si 3 N 4 /TiN(001) grown with a ―150 V substrate bias and analyzed in situ using angle-resolved X-ray photoelectron spectroscopycitations
- 2012The Si 3 N 4 /TiN interface: 6. Si/TiN(001) grown and analyzed in situ using angle-resolved X-ray photoelectron spectroscopy
- 2012The Si 3 N 4 /TiN interface: 5. TiN/Si 3 N 4 grown and analyzed in situ using angle-resolved X-ray photoelectron spectroscopy
- 2012The Si 3 N 4 /TiN interface: 4. Si 3 N 4 /TiN(001) grown with a ―250 V substrate bias and analyzed in situ using angle-resolved X-ray photoelectron spectroscopycitations
- 2012The Si 3 N 4 /TiN interface: 2. Si 3 N 4 /TiN(001) grown with a ―7 V substrate bias and analyzed in situ using angle-resolved X-ray photoelectron spectroscopycitations
- 2012The Si 3 N 4 /TiN interface: 7. Ti/TiN(001) grown and analyzed in situ using X-ray photoelectron spectroscopycitations
- 2012Super-compliant metallic electrodes for electroactive polymer actuatorscitations
- 2012Nanocomposite Al–Ge–N thin films and their mechanical and optical propertiescitations
- 2011Electronic structure of the SiN x /TiN interface: a model system for superhard nanocompositescitations
- 2007Tribological properties of nanocomposite CrC x /a-C:H thin filmscitations
- 2005Nanocomposite hard coatings: deposition issues and validation of their mechanical propertiescitations
- 2005Understanding nanostructured hard coatings: the importance of interfaces and interphases
- 2003Nanocomposite hard coatings for wear protectioncitations
- 2001Structure-performance relations in nanocomposite coatingscitations
- 2000From alloying to nanocomposites—improved performance of hard coatings
- 2000Nanocomposite TiC/a-C:H hard coatings deposited by reactive PVDcitations
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