Materials Map

Discover the materials research landscape. Find experts, partners, networks.

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The Materials Map is an open tool for improving networking and interdisciplinary exchange within materials research. It enables cross-database search for cooperation and network partners and discovering of the research landscape.

The dashboard provides detailed information about the selected scientist, e.g. publications. The dashboard can be filtered and shows the relationship to co-authors in different diagrams. In addition, a link is provided to find contact information.

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Materials Map under construction

The Materials Map is still under development. In its current state, it is only based on one single data source and, thus, incomplete and contains duplicates. We are working on incorporating new open data sources like ORCID to improve the quality and the timeliness of our data. We will update Materials Map as soon as possible and kindly ask for your patience.

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in Cooperation with on an Cooperation-Score of 37%

Topics

Publications (2/2 displayed)

  • 2018Modeling and design of a physical vapor deposition process assisted by thermal plasma (PS-PVD) ; Modélisation et dimensionnement d'un procédé de dépôt physique en phase vapeur assisté par plasma thermiquecitations
  • 2017On the Validity of Continuum Computational Fluid Dynamics Approach Under Very Low-Pressure Plasma Spray Conditions ; Plasma spray physical vapor deposition aims tosubstantially evaporate powders in order to produce coatingswith various microstructures. This is achieved bypowder vapor condensation onto the substrate and/or bydeposition of fine melted powder particles and nanoclusters.The deposition process typically operates at pressuresranging between 10 and 200 Pa. In addition to the experimentalworks, numerical simulations are performed tobetter understand the process and optimize the experimentalconditions. However, the combination of hightemperatures and low pressure with shock waves initiatedby supersonic expansion of the hot gas in the low-pressuremedium makes doubtful the applicability of the continuumapproach for the simulation of such a process. This workinvestigates (1) effects of the pressure dependence ofthermodynamic and transport properties on computationalfluid dynamics (CFD) predictions and (2) the validity of thecontinuum approach for thermal plasma flow simulationunder very low-pressure conditions. The study comparesthe flow fields predicted with a continuum approach usingCFD software with those obtained by a kinetic-basedapproach using a direct simulation Monte Carlo method(DSMC). It also shows how the presence of high gradientscan contribute to prediction errors for typical PS-PVDconditions.14citations

Places of action

Chart of shared publication
Goutier, Simon
1 / 7 shared
Mariaux, Gilles
1 / 7 shared
Vardelle, Armelle
1 / 13 shared
Zhang, Tao
1 / 23 shared
Itina, Tatiana
1 / 27 shared
Chart of publication period
2018
2017

Co-Authors (by relevance)

  • Goutier, Simon
  • Mariaux, Gilles
  • Vardelle, Armelle
  • Zhang, Tao
  • Itina, Tatiana
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