693.932 PEOPLE
| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Conard, Thierry
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (12/12 displayed)
- 2024Transient-assisted plasma etching (TAPE): Concept, mechanism, and prospectscitations
- 2022Properties of ultrathin molybdenum films for interconnect applicationscitations
- 2020Key Issues for the Development of a Ge CMOS Device in an Advanced IC Circuit
- 2020Thermal and Plasma Enhanced Atomic Layer Deposition of Al[sub 2]O[sub 3] on GaAs Substratescitations
- 2018Organic and perovskite solar cells for space applicationscitations
- 2017Nucleation Mechanism during WS2 Plasma Enhanced Atomic Layer Deposition on Amorphous Al2O3 and Sapphire Substrates
- 2017Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H-2 Plasma, and H2S
- 2010Properties of Ultrathin High Permittivity (Nb1-xTax)(2)O-5 Films Prepared by Aqueous Chemical Solution Depositioncitations
- 2009Thermally stable high effective work function TaCN thin films for metal gate electrode applications
- 2009Thermal and plasma enhanced atomic layer deposition of Al2O3 on GaAs substrates
- 2009Crystallization resistance of barium titanate zirconate ultrathin films from aqueous CSD: a study of cause and effectcitations
- 2005Atomic layer deposition of hafnium oxide on germanium substratescitations
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