693.932 PEOPLE
| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Mercier, Frédéric
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (11/11 displayed)
- 2022Green upconversion improvement of TiO2 codoped Er3+-Yb3+ nanoparticles based thin film by adding ALD-Al2O3 for silicon solar cell applicationscitations
- 2022Growth of polycrystalline SiC thin films by chemical vapor deposition for brain implanted electrodes
- 2022Ti3SiC2-SiC multilayer thin films deposited by high temperature reactive chemical vapor depositioncitations
- 2022Ti3SiC2-SiC multilayer thin films deposited by high temperature reactive chemical vapor depositioncitations
- 2020Synthesis of upconversion TiO2:Er3+-Yb3+ nanoparticles and deposition of thin films by spin coating techniquecitations
- 2019High temperature properties of AlN coatings deposited by chemical vapor deposition for solar central receiverscitations
- 2019Superconducting properties of NbN thin films deposited by plasma enhanced atomic layer deposition using a metalorganic precursor
- 2016Growth of boron nitride films on w-AlN (0001), 4° off-cut 4H-SiC (0001), W (110) and Cr (110) substrates by Chemical Vapor Depositioncitations
- 2015Superconducting properties of NbN thin films deposited by plasma enhanced atomic layer deposition using a metalorganic precursor
- 2014Niobium nitride thin films deposited by high temperature chemical vapor depositioncitations
- 2009Cubic silicon carbide crystal growth from high temperature solution
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