693.932 PEOPLE
| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Martinez, Eugénie
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (9/9 displayed)
- 2024Study of In0,53Ga0,47As/ InP/InAlAs/InP heterostructures by TOF-SIMS and HAXPES
- 2023Synthesis of AlOxNy thin films using a two-step PE-ALD processcitations
- 2023Characterization of GaN structures for power electronics by secondary ion mass spectrometry and atomic force microscope approach
- 2022High-energy photoelectron spectroscopy of AlN with Cr K$alpha$ excitationcitations
- 2022High-energy photoelectron spectroscopy of Si3N4 thin film on Si with Cr Kα excitationcitations
- 2020Improvement of AlN Film Quality Using Plasma Enhanced Atomic Layer Deposition with Substrate Biasingcitations
- 2020Analysis of InGaN surfaces after chemical treatments and atomic layer deposition of Al2O3 for uLED applicationscitations
- 2020Analysis of InGaN surfaces after chemical treatments and atomic layer deposition of Al2O3 for uLED applicationscitations
- 2019Study of Ge-rich GeSbTe etching process with different halogen plasmascitations
Places of action
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