693.932 PEOPLE
| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Ducroquet, F.
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Topics
Publications (8/8 displayed)
- 2020Optimization of the Electrical Characteristics of the Au/n-type InN/InP Schottky Diode Based on the Contact Technique of Different Diameters ; Оптимізація електричних характеристик діода Шотткі Au/n-InN/InP на основі контактної техніки різних діаметрів
- 2019Selective photocurrent generation in HfO2 and carbon nanotube hybrid nanocomposites under Ultra-Violet and visible photoexcitationscitations
- 2016Epitaxial growth of antiphase boundary free GaAs layer on 300 mm Si(001) substrate by metalorganic chemical vapour deposition with high mobilitycitations
- 2009Effect of annealing and electrical properties of high-k thin films grown by atomic layer deposition using carboxylic acids as oxygen sourcescitations
- 2009Addition of yttrium into HfO2 films: Microstructure and electrical propertiescitations
- 2008Carboxylic acids as oxygen sources for the atomic layer deposition of high-k metal oxides
- 2006Stabilisation of the cubic phase of HfO2 by Y addition in films grown by metal organic chemical vapor deposition
- 2005Pulsed liquid-injection MOCVD of high-K oxides for advanced semiconductor technologiescitations
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