693.932 PEOPLE
| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Bougdira, Jamal
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (8/8 displayed)
- 2014Crystallization Kinetics and Magnetic Properties of Fe40Ni40B20 Amorphous Ribboncitations
- 2014Microwave Plasma Process for SiCN:H Thin Films Synthesis with Composition Varying from SiC:H to SiN:H in H-2/N-2/Ar/Hexamethyldisilazane Gas Mixturecitations
- 2014Chemical bath composition effect on the properties of electrodeposited CuInSe2 thin filmscitations
- 2013Influence of Sn content on properties of ZnO:SnO2 thin films deposited by ultrasonic spray pyrolysiscitations
- 2013Study of the chemical etching of carbon surfaces facing argon/hydrogen plasmas in a helicon type reactor
- 2011The influence of CH(4) addition on composition, structure and optical characteristics of SiCN thin films deposited in a CH(4)/N(2)/Ar/hexamethyldisilazane microwave plasmacitations
- 2011The influence of CH(4) addition on composition, structure and optical characteristics of SiCN thin films deposited in a CH(4)/N(2)/Ar/hexamethyldisilazane microwave plasmacitations
- 2007Preliminary Synthesis of Carbon Nitride Thin Films by N2/CH4 Microwave Plasma Assisted Chemical Vapour Deposition: Characterisation of the Discharge and the Obtained Filmscitations
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