693.932 PEOPLE
| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Vallée, Corentin
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Topics
Publications (7/7 displayed)
- 2018Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer depositioncitations
- 2017High capacitance density of 185 nF/mm 2 achieved in three-dimensional MIM structures using TiO 2 as a dielectriccitations
- 2016Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO 2 thin films grown by the atomic layer deposition techniquecitations
- 2015Control of carbon content in amorphous GeTe films deposited by Plasma Enhanced Chemical Vapor deposition (PE-MOCVD) for Phase-Change Random Access Memory applicationscitations
- 2004Metal-Insulator-Metal capacitors using Y2O3 dielectric grown by pulsed-injection plasma enhanced metalorganic chemical vapor depositioncitations
- 2004Interface formation during the yttrium oxide deposition on Si by pulsed liquid-injection plasma enhanced metal organic chemical vapor depositioncitations
- 2002Nitrogen profiles in materials implanted via plasma-based ion implantationcitations
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