693.932 PEOPLE
| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Poodt, P.
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (15/15 displayed)
- 2018Characterization of nano-porosity in molecular layer deposited films:
- 2018Characterization of nano-porosity in molecular layer deposited films
- 2015A spatial ALD oxide passivation module in an all-spatial etch-passivation cluster conceptcitations
- 2015A spatial ALD oxide passivation module in an all-spatial etch-passivation cluster concept
- 2015Research update : Atmospheric pressure spatial atomic layer deposition of ZnO thin films : reactors, doping and devicescitations
- 2015Research Update: Atmospheric pressure spatial atomic layer deposition of ZnO thin films: Reactors, doping, and devices
- 2013The kinetics of low-temperature spatial atomic layer deposition of aluminum oxidecitations
- 2013History of atomic layer deposition and its relationship with the American Vacuum Societycitations
- 2013A new concept for spatially divided deep reactive ion etching with ALD based passivationcitations
- 2012Concept of spatially-divided deep reactive ion etching of si using oxide atomic layer deposition in the passivation cycle
- 2012Spatial atomic layer deposition: a route towards further industrialization of atomic layer depositioncitations
- 2012Low temperature and roll-to-roll spatial Atomic Layer Deposition for flexible electronicscitations
- 2012A new concept for spatially divided Deep Reactive Ion Etching with ALD-based passivationcitations
- 2011The business of fast ALD equipment for depositing alumina passivation layers on crystalline silicon solar cells
- 2010High-speed spatial atomic-layer deposition of aluminium oxide layers for solar cell passivationcitations
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