693.932 PEOPLE
| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Vallée, Christophe
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (8/8 displayed)
- 2021Low temperature Topographically Selective Deposition by Plasma Enhanced Atomic Layer Deposition with ion bombardment assistancecitations
- 2018Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
- 2017Selective deposition of Ta 2 O 5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition stepscitations
- 2014PECVD, RF vs Dual Frequency: investigation of plasma influence on metalorganic precursors decomposition and material characteristicscitations
- 2009Physicochemical and electrical characterizations of atomic layer deposition grown HfO(2) on TiN and Pt for metal-insulator-metal applicationcitations
- 2009Electrical properties of amorphous barium titanate films sputter deposited under hydrogen containing atmospherecitations
- 2007Experimental evidence for the role of electrodes and oxygen vacancies in voltage nonlinearities observed in high-k metal-insulator-metal capacitorscitations
- 2004Microstructure and electrical characterizations of yttrium oxide and yttrium silicate thin films deposited by pulsed liquid-injection plasma-enhanced metal-organic chemical vapor depositioncitations
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