Materials Map

Discover the materials research landscape. Find experts, partners, networks.

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The Materials Map is an open tool for improving networking and interdisciplinary exchange within materials research. It enables cross-database search for cooperation and network partners and discovering of the research landscape.

The dashboard provides detailed information about the selected scientist, e.g. publications. The dashboard can be filtered and shows the relationship to co-authors in different diagrams. In addition, a link is provided to find contact information.

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Materials Map under construction

The Materials Map is still under development. In its current state, it is only based on one single data source and, thus, incomplete and contains duplicates. We are working on incorporating new open data sources like ORCID to improve the quality and the timeliness of our data. We will update Materials Map as soon as possible and kindly ask for your patience.

To Graph

1.080 Topics available

To Map

977 Locations available

693.932 PEOPLE
693.932 People People

693.932 People

Show results for 693.932 people that are selected by your search filters.

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PeopleLocationsStatistics
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in Cooperation with on an Cooperation-Score of 37%

Topics

Publications (9/9 displayed)

  • 2014Influence of the V/III ratio in the gas phase on thin epitaxial AlN layers grown on (0001) sapphire by high temperature hydride vapor phase epitaxy29citations
  • 2014Influence of the V/III ratio in the gas phase on thin epitaxial AlN layers grown on (0001) sapphire by high temperature hydride vapor phase epitaxy29citations
  • 2013CFD modeling of the high-temperature HVPE growth of aluminum nitride layers on c-plane sapphire: from theoretical chemistry to process evaluation16citations
  • 2013Effects of the V/III ratio on the quality of aluminum nitride grown on (0001) sapphire by high temperature hydride vapor phase epitaxy11citations
  • 2013High temperature chemical vapor deposition of aluminum nitride, growth and evaluation27citations
  • 2010High temperature chemical vapor deposition of AlN/W1−xRex coatings on bulk SiCcitations
  • 2010High temperature chemical vapor deposition of AlN/W1−xRex coatings on bulk SiC3citations
  • 2009Influence of total pressure and precursors flow rates on the growth of aluminum nitride by high temperature chemical vapor deposition (HTCVD)citations
  • 2009Thermodynamic and experimental investigations on the growth of thick aluminum nitride layers by high temperature CVD26citations

Places of action

Chart of shared publication
Coindeau, S.
3 / 10 shared
Attal-Trétout, B.
2 / 3 shared
Beutier, G.
1 / 3 shared
Boichot, R.
7 / 11 shared
Coudurier, N.
5 / 7 shared
Sauvage, D.
2 / 2 shared
Balaji, M.
2 / 7 shared
Blanquet, E.
9 / 27 shared
Gélard, I.
2 / 2 shared
Luca, S.
2 / 3 shared
Pierret, A.
2 / 3 shared
Crisci, A.
3 / 7 shared
Baskar, K.
2 / 3 shared
Pons, M.
9 / 21 shared
Fellmann, V.
3 / 4 shared
Baccar, N.
1 / 1 shared
Mercier, Florian
4 / 12 shared
Milet, A.
1 / 1 shared
Pique, D.
5 / 7 shared
Lay, S.
1 / 21 shared
Roki, F. Z.
2 / 3 shared
Bernard, C.
2 / 11 shared
Huot, G.
2 / 2 shared
Chaffron, L.
2 / 12 shared
Poissonnet, S.
2 / 13 shared
Berne, Ph.
2 / 2 shared
Morais, M.
2 / 2 shared
Chaussende, D.
2 / 14 shared
Audier, M.
1 / 2 shared
Chart of publication period
2014
2013
2010
2009

Co-Authors (by relevance)

  • Coindeau, S.
  • Attal-Trétout, B.
  • Beutier, G.
  • Boichot, R.
  • Coudurier, N.
  • Sauvage, D.
  • Balaji, M.
  • Blanquet, E.
  • Gélard, I.
  • Luca, S.
  • Pierret, A.
  • Crisci, A.
  • Baskar, K.
  • Pons, M.
  • Fellmann, V.
  • Baccar, N.
  • Mercier, Florian
  • Milet, A.
  • Pique, D.
  • Lay, S.
  • Roki, F. Z.
  • Bernard, C.
  • Huot, G.
  • Chaffron, L.
  • Poissonnet, S.
  • Berne, Ph.
  • Morais, M.
  • Chaussende, D.
  • Audier, M.
OrganizationsLocationPeople