693.932 PEOPLE
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Szyszka, B.
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (31/31 displayed)
- 2015Rotatable serial co-sputtering of doped titaniacitations
- 2014Rotatable serial co-sputtering of doped titania
- 2011Reactive magnetron sputtering of ZnO:Al
- 2011Organic photovoltaic solar cells using thin tungsten oxide as interlayer anode contact material
- 2009Reactive magnetron sputtering of ZnO:Al
- 2009Optical modeling of free electron behavior in highly doped ZnO filmscitations
- 2009Large area deposition of Al-doped ZnO for Si-based thin film solar cells by magnetron sputtering
- 2008Development of advanced transparent conductive electrodes for large-area optoelectronic devices
- 2008Development of advanced transparent conductive electrodes for large-area opto-electronic devices
- 2008Research on promising applications for high power pulse magnetron sputtering
- 2007Flux of positive ions and film growth in reactive sputtering of Al-doped ZnO thin filmscitations
- 2006Parallel DSMC gasflow simulation of an in-line coater for reactive sputteringcitations
- 2006High power pulsed magnetron sputtering (HPPMS)
- 2006Plasma characterization tools and application to reactive sputtering of Al-doped ZnO thin films
- 2006ZnO : Al films deposited by in-line reactive AC magnetron sputtering for a-Si : H thin film solar cellscitations
- 2006A second hysteresis effect of reactive magnetron sputtering in compound mode
- 2006ZnO:Al films deposited by in-line reactive AC magnetron sputtering for a-Si:H thin film solar cellscitations
- 2005Modeling of the plasma impedance in reactive magnetron sputtering for various target materials
- 2004Modeling of the film thickness distribution along transport direction in in-line coaters for reactive sputtering
- 2003Growth behaviours and properties of the ZnO:Al films prepared by reactive mid-frequency magnetron sputteringcitations
- 2003Comparison of the ZnO:Al films deposited in static and dynamic modes by reactive mid-frequency magnetron sputteringcitations
- 2003Simulation of reactive sputtering kinetics in real in-line processing chamberscitations
- 2002Simulation of reactive magnetron sputtering kinetics in real in-line processing chambers
- 2002Simulation of reactive sputtering kinetics in real in-line processing chambers
- 2002Uniformity in large area ZnO:Al films prepared by reactive midfrequency magnetron sputteringcitations
- 2001Dynamic simulation of process control of the reactive sputter process using two seperate targets and experimental results
- 2001Upscaling of texture-etched zinc oxide substrates for silicon thin film solar cellscitations
- 2001Properties of aluminum-doped zinc oxide films deposited by high rate mid-frequency reactive magnetron sputteringcitations
- 2000Optimization of the reflectivity of magnetron sputter deposited silver filmscitations
- 2000Upscaling of texture-etched zinc oxide substrates for silicon thin film solar cells
- 2000Transparent and conductive ZnO:Al films prepared by reactive mf magnetron sputtering at high deposition rate
Places of action
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