693.932 PEOPLE
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Frach, P.
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (21/21 displayed)
- 2019Influence of growth conditions and film thickness on the anodization behavior of sputtered aluminum films and the fabrication of nanorod arrayscitations
- 2013Plasma deposition of hydrophobic coatings on structured surfaces for condensation and heat transfer applications
- 2012Scratch resistant optical coatings on polymers by magnetron-plasma-enhanced chemical vapor depositioncitations
- 2011High rate reactive sputter deposition of TiO2 films for photocatalyst and dye-sensitized solar cellscitations
- 2010Multifunctional optical coatings on polymers deposited by pulse magnetron sputtering and magnetron enhanced PECVD
- 2010Advanced key technologies for magnetron sputtering and PECVD of inorganic and hybrid transparent coatingscitations
- 2009Multifunctional optical coatings on polymers deposited by pulse magnetron sputtering and magnetron enhanced PECVD
- 2008Effect of structure and morphology on photocatalytic properties of TiO2 layerscitations
- 2008Reactive magnetron sputter technologies for precision optical and antireflective coatings on glass and polymer substrates
- 2006Photocatalytic TiO2 films deposited by reactive magnetron sputtering with unipolar pulsing and plasma emission control systemscitations
- 2004Photocatalytic properties of TiO2 films deposited by reactive sputtering in mid-frequency mode with dual cathodescitations
- 2004Ultra high-rate deposition of photocatalytic TiO2 films by reactive magnetron sputtering with unipolar pulsing and plasma emission control systems
- 2004Structure and properties of crystalline titanium oxide layers deposited by reactive pulse magnetron sputteringcitations
- 2004Graded refractive index layer systems for antireflective coatings and rugate filters deposited by reactive pulse magnetron sputteringcitations
- 2003Plasma emission control of reactive sputtering process in mid-frequency mode with dual cathodes to deposit photocatalytic TiO2 filmscitations
- 2003High Quality Photocatalytic TiO2 Films Deposited by Reactive Sputtering in Mid-Frequency Mode with Dual Cathodes
- 2003Impedance Control of Reactive Sputtering Process in Mid-Frequency Mode with Dual Cathodes to Deposit Al-Doped ZnO Filmscitations
- 2002Ensuring long term stability of process and film parameters during target lifetime in reactive magnetron sputteringcitations
- 2002Rutile and anatase phase TiO2 films obtained on unheated substrates by matched pulse mode and pulse parameters in reactive magnetron sputtering
- 2001Modeling the stability of reactive sputtering processescitations
- 2001Stationary reactive pulse magnetron sputtering of optical multilayers and gradient layers on 8" substrates
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