693.932 PEOPLE
| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Ehrhart, P.
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (7/7 displayed)
- 2007Thin Films of ZrO2 for High-k Applications Employing Engineered Alkoxide- and Amide-Based MOCVD Precursorscitations
- 2006Liquid injection MOCVD of ZrO2 thin films using a novel zirconium Bis(diethylamido)-bis(di-tert-butylmalonato) as a novel precursorcitations
- 2006Electrical properties of (Ba, Sr) TiO3 thin films revisited: the case of chemical vapor deposited films on Pt electrodescitations
- 2005SrTa2O6 thin films for high-K dielectric applications grown by chemical vapor deposition on different substratescitations
- 2004MOCVD of TiO2 thin films and studies on the nature of molecular mechanisms involved in the decomposition of [Ti(OPri)2(tbaoac)2]citations
- 2002Growth of (Ba,Sr)TiO3 thin films by MOCVD : stoichiometry effects
- 2000Atomistic simulation of diffuse X-ray scattering from defects in solids
Places of action
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