693.932 PEOPLE
| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Lazzeri, Paolo
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (6/6 displayed)
- 2008Interactions of photoresist stripping plasmas with nanoporous organo-silicate ultra low dielectric constant dielectricscitations
- 2006Damage of ultralow k materials during photoresist mask stripping processcitations
- 2005Porosity- induced effects during C4F8/90% Ar plasma etching of silica-based ultralow-k dielectricscitations
- 2005Thin Film Transformations and Volatile Products in the Formation of Nanoporous Low-K PMSSQ-based Dielectriccitations
- 2004ToF-SIMS studies of nanoporous PMSSQ materials: Kinetics and reactions in the processing of low-K dielectrics for ULSI applicationscitations
- 2003ToF-SIMS study of adhesive residuals on device contact pads after wafer taping and backgrinding
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