693.932 PEOPLE
| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Vehkamäki, Marko
University of Helsinki
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (41/41 displayed)
- 20243D-printed sensor electric circuits using atomic layer depositioncitations
- 2023Molecular layer deposition of hybrid silphenylene-based dielectric filmcitations
- 2023Atomic Layer Deposition of Boron-Doped Al2O3 Dielectric Filmscitations
- 2022Atomic layer deposition of GdF 3 thin filmscitations
- 2022Atomic layer deposition of GdF3 thin filmscitations
- 2022Atomic layer deposition of GdF3thin filmscitations
- 2022Atomic Layer Deposition of CsI and CsPbI3citations
- 2021Rhenium Metal and Rhenium Nitride Thin Films Grown by Atomic Layer Depositioncitations
- 2021Highly Material Selective and Self-Aligned Photo-assisted Atomic Layer Deposition of Copper on Oxide Materialscitations
- 2021Atomic Layer Deposition of Rhenium Disulfidecitations
- 2020Photoassisted atomic layer deposition of oxides employing alkoxides as single-source precursorscitations
- 2020Atomic Layer Deposition of PbS Thin Films at Low Temperaturescitations
- 2019As2S3 thin films deposited by atomic layer depositioncitations
- 2019Photoassisted atomic layer deposition of oxides employing alkoxides as single-source precursorscitations
- 2019Photoassisted atomic layer deposition of oxides employing alkoxides as single-source precursorscitations
- 2019Atomic Layer Deposition of PbI₂ Thin Filmscitations
- 2019Atomic Layer Deposition of Emerging 2D Semiconductors, HfS2 and ZrS2, for Optoelectronicscitations
- 2019Toward epitaxial ternary oxide multilayer device stacks by atomic layer depositioncitations
- 2018Rhenium Metal and Rhenium Nitride Thin Films Grown by Atomic Layer Depositioncitations
- 2018Metal oxide multilayer hard mask system for 3D nanofabricationcitations
- 2018Atomic Layer Deposition of Zirconium Dioxide from Zirconium Tetraiodide and Ozonecitations
- 2018Atomic Layer Deposition of Rhenium Disulfidecitations
- 2017As2S3 thin films deposited by atomic layer depositioncitations
- 2017(Invited) Photo-Assisted ALDcitations
- 2016Electric and Magnetic Properties of ALD-Grown BiFeO3 Filmscitations
- 2016Atomic Layer Deposition of Iridium Thin Films Using Sequential Oxygen and Hydrogen Pulsescitations
- 2016Bismuth iron oxide thin films using atomic layer deposition of alternating bismuth oxide and iron oxide layerscitations
- 2015Atomic layer deposition of zirconium dioxide from zirconium tetrachloride and ozonecitations
- 2015(Et3Si)2Se as a precursor for atomic layer deposition: growth analysis of thermoelectric Bi2Se3citations
- 2015Impedance spectroscopy study of the unipolar and bipolar resistive switching states of atomic layer deposited polycrystalline ZrO2 thin filmscitations
- 2015Studies on atomic layer deposition of IRMOF-8 thin filmscitations
- 2015Selective etching of focused gallium ion beam implanted regions from silicon as a nanofabrication methodcitations
- 2015Atomic Layer Deposition and Characterization of Bi2Te3 Thin Filmscitations
- 2015(Et3Si)(2)Se as a precursor for atomic layer depositioncitations
- 2014Combining focused ion beam and atomic layer deposition in nanostructure fabricationcitations
- 2014Sealing of Hard CrN and DLC Coatings with Atomic Layer Depositioncitations
- 2014Metal oxide films
- 2011Corrosion Protection of Steel with Oxide Nanolaminates Grown by Atomic Layer Depositioncitations
- 2007Degradation effects in TlBr single crystals under prolonged bias voltagecitations
- 2006Atomic layer deposition of ferroelectric bismuth titanate Bi4Ti3O12 thin filmscitations
- 2005New approach to the ALD of Bismuth silicatescitations
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