693.932 PEOPLE
| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Pedersen, Henrik
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (42/42 displayed)
- 2024The Influence of Carbon on Polytype and Growth Stability of Epitaxial Hexagonal Boron Nitride Filmscitations
- 2024On the origin of epitaxial rhombohedral-B4C growth by CVD on 4H-SiC†citations
- 2024Reinforcement of Polyimine Covalent Adaptable Networks with Mechanically Interlocked Derivatives of SWNTs.
- 2024Competitive co-diffusion as a route to enhanced step coverage in chemical vapor depositioncitations
- 2024On the origin of epitaxial rhombohedral-B<sub>4</sub>C growth by CVD on 4H-SiCcitations
- 2024Plasma electron characterization in electron chemical vapor depositioncitations
- 2023Atomic Layer Deposition as the Enabler for the Metastable Semiconductor InN and Its Alloyscitations
- 2023The influence of carbon on polytype and growth stability of epitaxial hexagonal boron nitride films and layerscitations
- 2023Biased quartz crystal microbalance method for studies of chemical vapor deposition surface chemistry induced by plasma electronscitations
- 2023Surface chemical mechanisms of trimethyl aluminum in atomic layer deposition of AlNcitations
- 2023Conformal chemical vapor deposition of boron-rich boron carbide thin films from triethylboroncitations
- 2023Chemical vapor deposition of amorphous boron carbide coatings from mixtures of trimethylboron and triethylboroncitations
- 2022Thermal atomic layer deposition of In2O3 thin films using a homoleptic indium triazenide precursor and watercitations
- 2022Texture evolution in rhombohedral boron carbide films grown on 4H-SiC(0001) and 4H-SiC(0001) substrates by chemical vapor depositioncitations
- 2022Fabrication of semi-transparent SrTaO2N photoanodes with a GaN underlayer grown via atomic layer depositioncitations
- 2022Growth of silicon carbide multilayers with varying preferred growth orientationcitations
- 2022Understanding indium nitride thin film growth under ALD conditions by atomic scale modelling : From the bulk to the In-rich layercitations
- 2022Surface Structures from NH(3) Chemisorption in CVD and ALD of AlN, GaN, and InN Filmscitations
- 2021Hexacoordinated Gallium(III) Triazenide Precursor for Epitaxial Gallium Nitride by Atomic Layer Deposition
- 2021Resolving Impurities in Atomic Layer Deposited Aluminum Nitride through Low Cost, High Efficiency Precursor Designcitations
- 2021Surface ligand removal in atomic layer deposition of GaN using triethylgalliumcitations
- 2021On the dynamics in chemical vapor deposition of InNcitations
- 2020In Situ Activation of an Indium(III) Triazenide Precursor for Epitaxial Growth of Indium Nitride by Atomic Layer Depositioncitations
- 2020Reduction of Carbon Impurities in Aluminum Nitride from Time-Resolved Chemical Vapor Deposition Using Trimethylaluminumcitations
- 2020Chemical vapor deposition of metallic films using plasma electrons as reducing agentscitations
- 2020Chemical vapor deposition of sp(2)-boron nitride on Si(111) substrates from triethylboron and ammonia: Effect of surface treatmentscitations
- 2019Atomic layer deposition of InN using trimethylindium and ammonia plasmacitations
- 2019Thermodynamic stability of hexagonal and rhombohedral boron nitride under chemical vapor deposition conditions from van der Waals corrected first principles calculationscitations
- 2018Plasma CVD of hydrogenated boron-carbon thin films from triethylboroncitations
- 2017Gas Phase Chemistry of Trimethylboron in Thermal Chemical Vapor Depositioncitations
- 2017Gas Phase Chemistry of Trimethylboron in Thermal Chemical Vapor Depositioncitations
- 2017Incorporation of dopants in epitaxial SiC layers grown with fluorinated CVD chemistrycitations
- 2016Trimethylboron as Single-Source Precursor for Boron-Carbon Thin Film Synthesis by Plasma Chemical Vapor Depositioncitations
- 2016Time as the Fourth Dimension: Opening up New Possibilities in Chemical Vapor Depositioncitations
- 2016Trimethylboron as single-source precursor for boron-carbon thin film synthesis by plasma chemical vapor depositioncitations
- 2015Gas phase chemical vapor deposition chemistry of triethylboron probed by boron-carbon thin film deposition and quantum chemical calculationscitations
- 2015Initial stages of growth and the influence of temperature during chemical vapor deposition of sp(2)-BN filmscitations
- 2014Studying chemical vapor deposition processes with theoretical chemistrycitations
- 2013Adsorption and surface diffusion of silicon growth species in silicon carbide chemical vapour deposition processes studied by quantum-chemical computationscitations
- 2012A novel high-power pulse PECVD methodcitations
- 2012On the effect of water and oxygen in chemical vapor deposition of boron nitridecitations
- 2011Epitaxial CVD growthof sp2-hybridized boron nitrideusing aluminum nitride as buffer layercitations
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