693.932 PEOPLE
| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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La Magna, Antonino
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (13/13 displayed)
- 2024Laser‐Annealed SiO 2 /Si 1− x Ge x Scaffolds for Nanoscaled Devices, Synergy of Experiment, and Computation
- 2023Impact of surface reflectivity on the ultra-fast laser melting of silicon-germanium alloyscitations
- 2023Study on the electrical properties of ultrathin in situ Boron-doped strained Si0.7Ge0.3 layers annealed by nanosecond pulsed laser
- 2023Spongy TiO<sub>2</sub> layers deposited by gig-lox sputtering processes: Contact angle measurementscitations
- 2022Plasmon resonances in silicon quantum wires
- 2022Multiscale Simulations for Defect-Controlled Processing of Group IV Materialscitations
- 2021Laser annealing processes in semiconductor technology ; Laser annealing processes in semiconductor technology: Theory, modeling, and applications in nanoelectronics
- 2019On the anomalous generation of {0 0 1} loops during laser annealing of ion-implanted siliconcitations
- 2017Evaluating depth distribution of excimer laser induced defects in silicon using micro-photoluminescence spectroscopy
- 2017Pervasive infiltration and multi-branch chemisorption of N-719 molecules into newly designed spongy TiO2 layers deposited by gig-lox sputtering processescitations
- 2017Ambipolar MoS2Transistors by Nanoscale Tailoring of Schottky Barrier Using Oxygen Plasma Functionalizationcitations
- 2016Controlled Al3+ Incorporation in the ZnO Lattice at 188 degrees C by Soft Reactive Co-Sputtering for Transparent Conductive Oxidescitations
- 2014Kinetic Monte Carlo simulations of boron activation in implanted Si under laser thermal annealingcitations
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