693.932 PEOPLE
| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Petrov, Ivan
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (55/55 displayed)
- 2024Exploring the thermal behavior and diffusive functionality of structural defects and phase boundaries in near-stoichiometric chromium diborides by <i>in situ</i> scanning transmission electron microscopy
- 2024Exploring the thermal behavior and diffusive functionality of structural defects and phase boundaries in near-stoichiometric chromium diborides by in situ scanning transmission electron microscopy
- 2023Towards lowering energy consumption during magnetron sputtering: Benefits of high-mass metal ion irradiationcitations
- 2023Energy-efficient physical vapor deposition of dense and hard Ti-Al-W-N coatings deposited under industrial conditionscitations
- 2023Growth and stability of epitaxial zirconium diboride thin films on silicon (111) substratecitations
- 2023Determining role of W+ ions in the densification of TiAlWN thin films grown by hybrid HiPIMS/DCMS technique with no external heatingcitations
- 2023Discovery of Guinier-Preston zone hardening in refractory nitride ceramicscitations
- 2022Dense, single-phase, hard, and stress-free Ti0.32Al0.63W0.05N films grown by magnetron sputtering with dramatically reduced energy consumptioncitations
- 2022Microstructure, mechanical, and corrosion properties of Zr1-xCrxBy diboride alloy thin films grown by hybrid high power impulse/DC magnetron co-sputteringcitations
- 2022On the nature of planar defects in transition metal diboride line compoundscitations
- 2021Dense Ti0.67Hf0.33B1.7 thin films grown by hybrid HfB2-HiPIMS/TiB2-DCMS co-sputtering without external heatingcitations
- 2021Toward energy-efficient physical vapor deposition : Routes for replacing substrate heating during magnetron sputter deposition by employing metal ion irradiationcitations
- 2021Age hardening in superhard ZrB2-rich Zr1-xTaxBy thin filmscitations
- 2021Towards energy-efficient physical vapor deposition : Mapping out the effects of W+ energy and concentration on the densification of TiAlWN thin films grown with no external heatingcitations
- 2021Systematic compositional analysis of sputter-deposited boron-containing thin filmscitations
- 2020The influence of pressure and magnetic field on the deposition of epitaxial TiBx thin films from DC magnetron sputteringcitations
- 2020Growth of dense, hard yet low-stress Ti0.40Al0.27W0.33N nanocomposite films with rotating substrate and no external substrate heatingcitations
- 20203D-to-2D morphology manipulation of sputter-deposited nanoscale silver films on weakly interacting substrates via selective nitrogen deployment for multifunctional metal contactscitations
- 2020Improving the high-temperature oxidation resistance of TiB2 thin films by alloying with Alcitations
- 2019Strategy for simultaneously increasing both hardness and toughness in ZrB2-rich Zr1-xTaxBy thin filmscitations
- 2019Mechanical properties of VMoNO as a function of oxygen concentration: Toward development of hard and tough refractory oxynitridescitations
- 2019Corrosion Resistant TiTaN and TiTaAlN Thin Films Grown by Hybrid HiPIMS/DCMS Using Synchronized Pulsed Substrate Bias with No External Substrate Heatingcitations
- 2019A review of the intrinsic ductility and toughness of hard transition-metal nitride alloy thin filmscitations
- 2018Time evolution of ion fluxes incident at the substrate plane during reactive high-power impulse magnetron sputtering of groups IVb and VIb transition metals in Ar/N-2citations
- 2018Elastic properties and plastic deformation of TiC- and VC-based alloyscitations
- 2018Growth and mechanical properties of 111-oriented V0.5Mo0.5Nx/Al2O3(0001) thin filmscitations
- 2018Controlling the B/Ti ratio of TiBx thin films grown by high-power impulse magnetron sputteringcitations
- 2018Low temperature (T-s/T-m < 0.1) epitaxial growth of HfN/MgO(001) via reactive HiPIMS with metal-ion synchronized substrate biascitations
- 2017Control of the metal/gas ion ratio incident at the substrate plane during high-power impulse magnetron sputtering of transition metals in Arcitations
- 2017Low-temperature growth of dense and hard Ti0.41Al0.51Ta0.08N films via hybrid HIPIMS/DC magnetron co-sputtering with synchronized metal-ion irradiationcitations
- 2017Gas rarefaction effects during high power pulsed magnetron sputtering of groups IVb and VIb transition metals in Arcitations
- 2016Nitrogen-doped bcc-Cr films: Combining ceramic hardness with metallic toughness and conductivitycitations
- 2015Strategy for tuning the average charge state of metal ions incident at the growing film during HIPIMS depositioncitations
- 2015Dynamic and structural stability of cubic vanadium nitridecitations
- 2015Control of Ti1-xSixN nanostructure via tunable metal-ion momentum transfer during HIPIMS/DCMS co-depositioncitations
- 2014Elastic constants, Poisson ratios, and the elastic anisotropy of VN(001), (011), and (111) epitaxial layers grown by reactive magnetron sputter depositioncitations
- 2014Novel strategy for low-temperature, high-rate growth of dense, hard, and stress-free refractory ceramic thin filmscitations
- 2014Structure evolution and Properties of TiAlCN/VCN Coatings Deposited by Reactive HIPIMScitations
- 2014Ab-initio and classical molecular dynamics simulations of N2 desorption from TiN(001) surfacescitations
- 2014X-ray photoelectron spectroscopy analyses of the electronic structure of polycrystalline Ti1-xAlxN thin films with 0 < x < 0.96citations
- 2014Si incorporation in Ti1-xSixN films grown on TiN(001) and (001)-faceted TiN(111) columnscitations
- 2013Sputter-cleaned Epitaxial VxMo(1-x)Ny/MgO(001) Thin Films Analyzed by X-ray Photoelectron Spectroscopy: 3. Polycrystalline V0.49Mo0.51N1.02citations
- 2013Sputter-cleaned Epitaxial VxMo(1-x)Ny/MgO(001) Thin Films Analyzed by X-ray Photoelectron Spectroscopy: 2. Single-crystal V0.47Mo0.53N0.92citations
- 2013Sputter-cleaned Epitaxial VxMo(1-x)Ny/MgO(001)Thin Films Analyzed by X-ray PhotoelectronSpectroscopy: 3. Polycrystalline V0.49Mo0.51N1.02citations
- 2013Sputter-cleaned Epitaxial VxMo(1-x)Ny/MgO(001) Thin Films Analyzed by X-ray Photoelectron Spectroscopy: 1. Single-crystal V0.48Mo0.52N0.64citations
- 2012The Si 3 N 4 /TiN interface: 3. Si 3 N 4 /TiN(001) grown with a ―150 V substrate bias and analyzed in situ using angle-resolved X-ray photoelectron spectroscopycitations
- 2012The Si 3 N 4 /TiN interface: 6. Si/TiN(001) grown and analyzed in situ using angle-resolved X-ray photoelectron spectroscopy
- 2012The Si 3 N 4 /TiN interface: 5. TiN/Si 3 N 4 grown and analyzed in situ using angle-resolved X-ray photoelectron spectroscopy
- 2012The Si 3 N 4 /TiN interface: 4. Si 3 N 4 /TiN(001) grown with a ―250 V substrate bias and analyzed in situ using angle-resolved X-ray photoelectron spectroscopycitations
- 2012The Si 3 N 4 /TiN interface: 2. Si 3 N 4 /TiN(001) grown with a ―7 V substrate bias and analyzed in situ using angle-resolved X-ray photoelectron spectroscopycitations
- 2012The Si 3 N 4 /TiN interface: 7. Ti/TiN(001) grown and analyzed in situ using X-ray photoelectron spectroscopycitations
- 2012Metal versus rare-gas ion irradiation during Ti1-xAlxN film growth by hybrid high power pulsed magnetron/dc magnetron co-sputtering using synchronized pulsed substrate biascitations
- 2012Configurational disorder effects on adatom mobilities on Ti1-xAlxN(001) surfaces from first principlescitations
- 2011Electronic structure of the SiN x /TiN interface: a model system for superhard nanocompositescitations
- 2010The Formation and Utility of Sub-Angstrom to Nanometer-Sized Electron Probes in the Aberration-Corrected Transmission Electron Microscope at the University of Illinoiscitations
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