693.932 PEOPLE
| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Lundin, Daniel
Linköping University
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (24/24 displayed)
- 2025Epitaxial growth of TiZrNbTaN films without external heating by high-power impulse magnetron sputteringcitations
- 2024Plasma electron characterization in electron chemical vapor depositioncitations
- 2023On selective ion acceleration in bipolar HiPIMS: A case study of (Al,Cr)2O3 film growthcitations
- 2023Biased quartz crystal microbalance method for studies of chemical vapor deposition surface chemistry induced by plasma electronscitations
- 2023Corundum-structured AlCrNbTi oxide film grown using high-energy early-arriving ion irradiation in high-power impulse magnetron sputteringcitations
- 2023HiPIMS-grown AlN buffer for threading dislocation reduction in DC-magnetron sputtered GaN epifilm on sapphire substratecitations
- 2021Modeling of high power impulse magnetron sputtering discharges with graphite targetcitations
- 2021Low temperature growth of stress-free single phase alpha-W films using HiPIMS with synchronized pulsed substrate biascitations
- 2021Influence of Metal Substitution and Ion Energy on Microstructure Evolution of High-Entropy Nitride (TiZrTaMe)N1-x (Me = Hf, Nb, Mo, or Cr) Filmscitations
- 2020Chemical vapor deposition of metallic films using plasma electrons as reducing agentscitations
- 2020Low resistivity amorphous carbon-based thin films employed as anti-reflective coatings on coppercitations
- 2019Tuning high power impulse magnetron sputtering discharge and substrate bias conditions to reduce the intrinsic stress of TiN thin filmscitations
- 2018Low temperature (T-s/T-m < 0.1) epitaxial growth of HfN/MgO(001) via reactive HiPIMS with metal-ion synchronized substrate biascitations
- 2018Influence of backscattered neutrals on the grain size of magnetron-sputtered TaN thin filmscitations
- 2017Benefits of energetic ion bombardment for tailoring stress and microstructural evolution during growth of Cu thin filmscitations
- 2017Epitaxial growth of Cu(001) thin films onto Si(001) using a single-step HiPIMS processcitations
- 2014Anti-vibration Engineering in Internal Turning Using a Carbon Nanocomposite Damping Coating Produced by PECVD Processcitations
- 2012Influence of ionization degree on film properties when using high power impulse magnetron sputteringcitations
- 2012Influence of ionization degree on film properties when using high power impulse magnetron sputteringcitations
- 2012An introduction to thin film processing using high-power impulse magnetron sputteringcitations
- 2012A novel high-power pulse PECVD methodcitations
- 2012High power impulse magnetron sputtering dischargecitations
- 2010The HiPIMS Process
- 2008Plasma properties in high power impulse magnetron sputtering
Places of action
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