693.932 PEOPLE
| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Bousquet, Angélique
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (8/8 displayed)
- 2023Comprehensive study of WSiC:H coatings synthesized by microwave-assisted RF reactive sputteringcitations
- 2023Reactive sputtering onto an ionic liquid, a new synthesis route for bismuth-based nanoparticlescitations
- 2021An investigation of adhesion mechanisms between plasma-treated PMMA support and aluminum thin films deposited by PVDcitations
- 2020Electrochromic Thin Films Based on NiAl Layered Double Hydroxide Nanoclusters for Smart Windows and Low-Power Displayscitations
- 2020SiCN:H thin films deposited by MW‐PECVD with liquid organosilicon precursor: Gas ratio influence versus properties of the depositscitations
- 2016In Situ Monitoring of Cu(In1-x,Gax)Se2 Composition and Target Poisoning by Real Time Optical Emission Spectroscopy During Deposition From a Hybrid Sputtering/Evaporation Process.citations
- 2015Multiphase Structure of Tantalum Oxynitride TaOxNy Thin Films Deposited by Reactive Magnetron Sputteringcitations
- 2014Structural and ellipsometric study on tailored optical properties of tantalum oxynitride films deposited by reactive sputteringcitations
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