693.932 PEOPLE
| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Ylivaara, Oili
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (12/12 displayed)
- 2023Nonlinear Dynamics of Large-Angle Circular Scanning With an Aluminum Nitride Micro-Mirrorcitations
- 2018Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride filmscitations
- 2016Thermal conductivity of amorphous Al 2 O 3 / TiO 2 nanolaminates deposited by atomic layer depositioncitations
- 2016Effect of precursor chemistry on residual stress of ALD Al 2 O 3 and TiO 2 films
- 2016Study of processing parameters on the mechanical and compositional properties of plasma-enhanced atomic layer deposition aluminum nitride films
- 2016Highly conformal TiN by atomic layer deposition:growth and characterization
- 2016Residual stress in thin films made by atomic layer deposition
- 2013ALD Al2O3 from TMA and water on Si: residual stress, elastic modulus, hardness and adhesion:residual stress, elastic modulus, hardness and adhesion
- 2013ALD Al2O3 from TMA and water on Si: residual stress, elastic modulus, hardness and adhesion
- 2012On the nanoindentation characterization of Al2O3 thin films grown on Si-wafer by atomic layer deposition
- 2012Adhesion performance and tribological properties of atomic layer deposited aluminum oxide films
- 2010Direct wafer bonding of ALD Al2O3
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