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White, J. M.
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document
Real Time Study of Cu Diffusion Through a Ru Thin Film by Photoemission Electron Microscopy (PEEM)
Abstract
We demonstrate the efficacy of Photoemission Electron Microscopy (PEEM) as a tool to detect metal diffusion processes at nanoscale spatial resolution in real time. For a sample comprising a nominally 1nm physical vapor-deposited (PVD) Ru thin film covering a thick Cu substrate, we have observed the appearance of bright features on a dark background as the temperature is monotonically increased and irradiated with photons from a Hg are lamp. These bright features are the result of a lower work function due to Cu diffusion through the Ru films.