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Naji, M. |
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Motta, Antonella |
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Aletan, Dirar |
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Mohamed, Tarek |
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Ertürk, Emre |
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Taccardi, Nicola |
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Kononenko, Denys |
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Petrov, R. H. | Madrid |
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Alshaaer, Mazen | Brussels |
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Bih, L. |
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Casati, R. |
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Muller, Hermance |
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Kočí, Jan | Prague |
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Šuljagić, Marija |
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Kalteremidou, Kalliopi-Artemi | Brussels |
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Azam, Siraj |
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Ospanova, Alyiya |
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Blanpain, Bart |
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Ali, M. A. |
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Popa, V. |
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Rančić, M. |
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Ollier, Nadège |
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Azevedo, Nuno Monteiro |
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Landes, Michael |
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Rignanese, Gian-Marco |
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Paranthoen, Cyril
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Topics
Publications (7/7 displayed)
- 2019Towards MIR VCSELs operating in CW at RT
- 2016Enhancement of VCSEL performances using a novel bonding process based on localized electroplating copper through Silicon vias
- 2016Enhancement of VCSEL performances using a novel bonding process based on localized electroplating copper through Silicon vias
- 2006Temperature studies on a single InAs/InP QD layer laser emitting at 1.55 µmcitations
- 2006Influence of the number of quantum dots stacks on the threshold current density of 1.55 µm InAs/InP(311)B semiconductor lasers
- 2005Temperature studies on a single InAs/InP QD layer laser emitting at 1.55 µmcitations
- 2003Comparison of radiative and structural properties of 1.3 μm InxGa(1−x)As quantum-dot laser structures grown by metalorganic chemical vapor deposition and molecular-beam epitaxy: Effect on the lasing propertiescitations
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document
Enhancement of VCSEL performances using a novel bonding process based on localized electroplating copper through Silicon vias
Abstract
The development of power efficient vertical-cavity surface-emitting lasers (VCSELs) in the 1.55µm range, with relatively high output power (>1mW) and enhanced thermal dissipation is still challenging, but would represent a real breakthrough for the scientific community, with important perspectives in different areas of fundamental research and applied physics (WDM and FTTH networks, gas sensing and deformation detectors, microwaves, etc.). In this context, a novel bonding technique is presented in this work. It relies on the use of a BCB polymer bonding to virtually report any material on a Si host platform, through the use of Cu-filled vias acting as µ-heat sinks. This so-called Through Silicon Holes Electroplated Copper (TSHEC) technique has undoubtedly several advantages, since it allows a hybrid integration of III-V active regions on a Si substrate (for photonics, microelectronics, microfluidics integration), it avoids stress-induced limitation with respect of standard large Cu surface solutions, and it is cost-effective. Moreover, it is fully compatible with optical pumping as well as electrical injection schemes. This approach has been recently validated in the case of InP-based OP-VCSEL structures, for which an emission power exceeding 2mW with a threshold as low as 7mW at 20°C has been demonstrated, in the case of a bottom hybrid metal-dielectric Bragg mirror (H-DBR) of 20µm in diameter. Different diameter sizes for the bottom H-DBR have been tested, ranging from 20µm up to 100µm. According to the size of the H-DBR, different values for the output power have been measured, together with a red shift of the laser emission, which are related to different values for the thermal impedance of the devices.