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Jeang, E.
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article
Fabrication of a novel nano-probe slide for near-field optical microscopy
Abstract
A novel probe structure, which can act as a planar nano-probe slide for near-field microscopy, was proposed and fabricated. Sub-wavelength apertures on a Si substrate are successfully produced by means of standard photolithography techniques with properly selected masks. In particular, the anisotropic etching characteristics of Si substrate and the hardness of the Si3N4 film are utilized. Probe-to-probe scanning of the fabricated near-field nano-probe slide shows sub-wavelength confinement of light and comparable throughput to the conventional optical fiber probe. We also show that the nano-probe slide can serve as a supporting base and a sub-wavelength aperture to obtain the near-field photoluminescence spectra of a limited number of CdSe nanocrystals.