• Rebollo, Francisco Javier Aparicio

Abstract

The Remote Plasma Assisted Vacuum Deposition (RPAVD) process is a versatile methodology for the fabrication of functional nanocomposites from non-chemically polymerizable organic or organometallic functional molecules. This approach combines the physicochemical reactions involved in plasma polymerization processes with the sublimation of functional molecules of interest for the target applications. The obtained solid thin films consist of a well cross-linked plasma polymer matrix typically insoluble in organic solvent, thermally stable at temperatures higher than the sublimation temperaturas of the precursor molecules, and well adhered to the substrate. These films incorporate a controllable concentration of virtually any kind of thermally stable photo-functional molecule. The deposition process is carried out in a dry, room temperatura and single fabrication step. The method is scalable at wafer level and fully compatible with the use of solvent-sensitive and delicate substrates. The process has been initially applied for the development of optical thin films and photonic devices including filters, integrated photonic chips and lasing media. However, the properties of the films can be tailored to other functional application. In this communication we will show how films derived from simple hydrocarbon precursors can be applied for the development of controlled wetting and ice retarding surfaces, antimicrobial surfaces or highperformance dielectric ultrathin films for organic electronics.

Topics

• Deposition
• nanocomposite
• impedance spectroscopy
• surface
• polymer
• thin film
• organometallic