| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Van De Kruijs, Robbert
University of Twente
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (22/22 displayed)
- 2024Structural pathways for ultrafast melting of optically excited thin polycrystalline Palladium filmscitations
- 2024Oxidation of thin film binary entropy alloys
- 2022Relation between composition and fracture strength in off-stoichiometric metal silicide free-standing membranescitations
- 2022Fracture Toughness of Free-Standing ZrSiₓ Thin Films Measured Using Crack-on-a-Chip Methodcitations
- 2021Strengthening ultrathin Si3N4 membranes by compressive surface stresscitations
- 2021Hydrogen etch resistance of aluminium oxide passivated graphitic layerscitations
- 2018Damage accumulation in thin ruthenium films induced by repetitive exposure to femtosecond XUV pulses below the single-shot ablation thresholdcitations
- 2017In-vacuo growth studies and thermal oxidation of ZrO2 thin films
- 2017In vacuo low-energy ions scattering studies of ZrO2 growth by magnetron sputtering
- 2017Detection of defect populations in superconductor boron subphosphide B12P2 through X-ray absorption spectroscopycitations
- 2016In-vacuo growth studies of ZrO2 thin films
- 2016Structure of high-reflectance La/B-based multilayer mirrors with partial La nitridationcitations
- 2016Growth kinetics of Ru on Si, SiN and SiO2 studied by in-vacuo low energy ion scattering (LEIS)
- 2016Exploiting the P L2,3 absorption edge for optics: spectroscopic and structural characterization of cubic boron phosphide thin filmscitations
- 2015Determination of oxygen diffusion kinetics during thin film ruthenium oxidationcitations
- 2014Subwavelength single layer absorption resonance antireflection coatingscitations
- 2013Engineering optical constants for broadband single layer anti-reflection coatings
- 2012Chemical interactions at the interfaces of Mo/B4C/Si/B4C multilayers upon low-temperature annealing
- 2012Multilayer development for the generation beyond EUV: 6.x nm
- 2010Enhanced diffusion upon amorphous-to-nanocrystalline phase transition in Mo/B4C/Si layered systemscitations
- 2009In-depth agglomeration of d-metals at Si-on-Mo interfacescitations
- 2009Chemically mediated diffusion of d-metals and B through Si and agglomeration at Si-on-Mo interfacescitations
Places of action
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document
In-vacuo growth studies of ZrO2 thin films
Abstract
ZrO2 thin films might be used as capping layers for protecting extreme ultraviolet (EUV) optics against oxidation and other chemical degradation processes. These coatings should be homogeneous and form a closed layer, not degrade the underneath barrier/mirror, and have a thickness in the nanometre range to keep good reflection properties of the mirror. The initial growth of ZrO2 films by reactive magnetron sputtering on top of amorphous Si was monitored by in vacuo low-energy ion scattering (LEIS). With this technique, the atomic composition of the outermost atomic layer of a surface can be probed. By monitoring for which deposited amount of ZrO2 the signal from the underlying Si vanishes, the ZrO2 thickness required for forming a closed layer was determined. In this way, LEIS was employed to study how deposition parameters influence the sharpness of the interface between the cap layer and Si. In-vacuo X-ray photoelectron spectroscopy (XPS) was used to find the optimal deposition conditions and the stoichiometry of the produced layers. Depending on deposition conditions, a fully closed layer can be formed with a deposited ZrO2 thickness of 1.7 nm. Passivation of the Si underlayer by nitrogen or oxygen was found to have no influence on the sharpness of the interface with the ZrO2 cap. Based on the smoothness of the as deposited layers, as probed by AFM analysis, it was concluded that intermixing, rather than island formation, is limiting the sharpness of the ZrO2/Si interface.