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Naji, M. |
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Motta, Antonella |
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Aletan, Dirar |
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Mohamed, Tarek |
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Ertürk, Emre |
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Taccardi, Nicola |
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Kononenko, Denys |
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Petrov, R. H. | Madrid |
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Alshaaer, Mazen | Brussels |
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Bih, L. |
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Casati, R. |
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Muller, Hermance |
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Kočí, Jan | Prague |
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Šuljagić, Marija |
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Kalteremidou, Kalliopi-Artemi | Brussels |
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Azam, Siraj |
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Ospanova, Alyiya |
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Blanpain, Bart |
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Ali, M. A. |
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Popa, V. |
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Rančić, M. |
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Ollier, Nadège |
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Azevedo, Nuno Monteiro |
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Landes, Michael |
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Rignanese, Gian-Marco |
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Davis, Rf
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Topics
Publications (10/10 displayed)
- 2005Structural TEM study of nonpolar a-plane gallium nitride grown on (1120) 4H-SiC by organometallic vapor phase epitaxycitations
- 2005Transmission electron microscopy study of nonpolar a-plane GaN grown by pendeo-epitaxy on (11(2)under-bar0) 4H-SiC
- 2004Characterization and comparison of 4H-SiC(11(2)over-bar0) and 4H-SiC(0001) 8 degrees off-axis substrates and homoepitaxial films
- 2003Growth and characterization of epitaxial GaN thin films on 4H-SiC (11.0) substrates
- 2003Supersonic jet epitaxy of gallium nitride using triethylgallium and ammoniacitations
- 2003Microstructure of nonpolar a-plane GaN grown on (1120) 4H-SiC investigated by TEM.
- 2002Electrical, structural and microstructural characteristics of as-deposited and annealed Pt and Au contacts on chemical-vapor-cleaned GaN thin films
- 2000Pendeo-epitaxial growth of gallium nitride on silicon substrates
- 2000Advanced PENDEOEPITAXY (TM) of GaN and AlxGa1-xN thin films on SiC(0001) and Si(111) substrates via metalorganic chemical vapor deposition
- 2000Pendeo-epitaxy (TM) process for aluminum gallium nitride thin films on silicon carbide substrates via metalorganic chemical vapor deposition
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article
Electrical, structural and microstructural characteristics of as-deposited and annealed Pt and Au contacts on chemical-vapor-cleaned GaN thin films
Abstract
<p>Schottky contacts of Pt(111) and Au(111) were deposited on chemical-vapor-cleaned, n-type GaN(0001) thin films. The growth mode of the deposition, as determined by x-ray photoelectron spectroscopy analysis, followed the two-dimensional Frank-van der Merwe growth model. The resulting as-deposited metal films were monocrystalline and epitaxial with a (111)//(0002) relationship with the GaN. Selected samples were annealed for three minutes at 400 degreesC, 600 degreesC or 800 degreesC. The rectifying behavior of both contacts degraded at 400 degreesC; they became ohmic after annealing at 600 degreesC (Au) or 800 degreesC (Pt). High-resolution transmission electron micrographs revealed reactions at the metal/GaN interfaces for the higher temperature samples. X-ray diffraction results revealed an unidentified phase in the Pt sample annealed at 800 degreesC. A decrease in the room temperature in-plane (111) lattice constant for both metals, ranging from -0.1% to -0.5%, was observed as the annealing temperature was increased from 400 to 800 degreesC. This plastic deformation was caused by tensile stresses along the [111] direction that exceeded the yield strength as a result of the large differences in the coefficients of thermal expansion between the metal contacts and the GaN film. (C) 2002 American Institute of Physics.</p>