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Naji, M. |
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Motta, Antonella |
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Aletan, Dirar |
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Mohamed, Tarek |
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Ertürk, Emre |
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Taccardi, Nicola |
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Kononenko, Denys |
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Petrov, R. H. | Madrid |
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Alshaaer, Mazen | Brussels |
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Bih, L. |
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Casati, R. |
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Muller, Hermance |
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Kočí, Jan | Prague |
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Šuljagić, Marija |
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Kalteremidou, Kalliopi-Artemi | Brussels |
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Azam, Siraj |
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Ospanova, Alyiya |
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Blanpain, Bart |
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Ali, M. A. |
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Popa, V. |
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Rančić, M. |
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Ollier, Nadège |
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Azevedo, Nuno Monteiro |
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Landes, Michael |
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Rignanese, Gian-Marco |
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Schlottig, G.
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Topics
Publications (12/12 displayed)
- 2016Intra-stack sealing of tier interconnects using the interconnect alloycitations
- 2015Nanoparticle assembly and sintering towards all-copper flip chip interconnectscitations
- 2011Delamination Toughness of Cu-EMC Interfaces at Harsh Environment
- 2011Temperature moisture and mode mixity dependent EMC-Copper (oxide) interfacial toughness
- 2010Delamination and combined compound cracking of EMC-copper interfaces
- 2010Temperature moisture and mode mixity dependent EMC- Copper (Oxide) interfacial toughness
- 2010Interfacial fracture parameters of silicon-to-molding compound
- 2010Procedure to determine interfacial toughness of EMC-copper (oxide) interfaces
- 2009How to fabricate specimens for silicon-to-molding compound interface adhesion measurementscitations
- 2009Establishing mixed mode fracture properties of EMC-copper (-oxide) interfaces at various temperaturescitations
- 2009Establishing mixed mode fracture properties of EMC-copper (-oxide) interfaces at various temperaturescitations
- 2008Mixed mode interface characterization considering thermal residual stresscitations
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document
Delamination Toughness of Cu-EMC Interfaces at Harsh Environment
Abstract
Interfacial delamination has become one of the key reliability issues in the microelectronic industry and therefore is getting more and more attention. The analysis of delamination of a laminate structure with a crack along the interface is central to the characterization of the interfacial toughness. Interfacial toughness is highly dependent of temperature, moisture and mode mixity. the present study deals with delamination toughness measurements of an epoxy molding compound - copper lead frame interface as directly obtained from a real production process in harsh environment, temperature >100 degrees C & 100%RH. To deal with it, a chamber with high pressure, i.e. pressure vessel or pressure cooker, is needed. Controlling the inside pressure makes it possible to have 100% RH at different temperature levels. In addition to the initial stress state due to the harsh environment, mechanical loading under combined mode I/II conditions is applied on a bi-material specimen to initiate and propagate the delamination. For this a mixed mode bending setup is installed in the pressure chamber.