| People | Locations | Statistics |
|---|---|---|
| Naji, M. |
| |
| Motta, Antonella |
| |
| Aletan, Dirar |
| |
| Mohamed, Tarek |
| |
| Ertürk, Emre |
| |
| Taccardi, Nicola |
| |
| Kononenko, Denys |
| |
| Petrov, R. H. | Madrid |
|
| Alshaaer, Mazen | Brussels |
|
| Bih, L. |
| |
| Casati, R. |
| |
| Muller, Hermance |
| |
| Kočí, Jan | Prague |
|
| Šuljagić, Marija |
| |
| Kalteremidou, Kalliopi-Artemi | Brussels |
|
| Azam, Siraj |
| |
| Ospanova, Alyiya |
| |
| Blanpain, Bart |
| |
| Ali, M. A. |
| |
| Popa, V. |
| |
| Rančić, M. |
| |
| Ollier, Nadège |
| |
| Azevedo, Nuno Monteiro |
| |
| Landes, Michael |
| |
| Rignanese, Gian-Marco |
|
Mussenbrock, Thomas
Ruhr University Bochum
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (9/9 displayed)
- 2023The effects of catalyst conductivity and loading of dielectric surface structures on plasma dynamics in patterned dielectric barrier discharges
- 2023The effects of catalyst conductivity and loading of dielectric surface structures on plasma dynamics in patterned dielectric barrier dischargescitations
- 2022Nanoporous SiOx plasma polymer films as carrier for liquid‐infused surfacescitations
- 2018Improved homogeneity of plasma and coating properties using a lance matrix gas distribution in MW-PECVDcitations
- 2016Influence of ion energy and ion-to-growth flux ratio on PVD coatings in a multi-frequency capacitively coupled plasma
- 2013Continuum and Kinetic Simulations of the Neutral Gas Flow in an Industrial Physical Vapor Deposition Reactor
- 2013Kinetic simulation of neutral particle transport in sputtering processes
- 2013Continuum and kinetic simulations of the neutral gas flow in an industrial physical vapor deposition reactor
- 2012A first step toward the modeling of instabilities in high power pulse magnetron sputtering plasmas
Places of action
| Organizations | Location | People |
|---|
document
Kinetic simulation of neutral particle transport in sputtering processes
Abstract
For many physical vapor deposition applications using sputtering processes, knowledge about the detailed spatial and temporal evolution of the involved gas species is of great importance. Modeling of the involved gas dynamic and plasma processes is however challenging, because the operating pressure is typically below 1 Pa. In consequence, only kinetic descriptions are appropriate. In order to approach this problem, the dynamics of sputtered particle transport through a neutral gas background is simulated. For this study, a modified version of the three-dimensional Direct Simulation Monte Carlo (DSMC) code dsmcFoam is utilized. The impact of a transient sputtering wind is investigated in a generic reactor geometry, which may be used for dc Magnetron Sputtering (dcMS), High Power Impulse Magnetron Sputtering (HiPIMS), as well as sputtering in capacitively coupled discharges. In the present work a rarefaction of the background gas is observed. Moreover in pulsed mode the temporal dynamics of the rarefaction and subsequent recovery of the background gas is investigated. This work is supported by the German Research Foundation in the frame of TRR 87....