| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Chiriaev, Serguei
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (19/19 displayed)
- 2023Nanoscale thinning of metal-coated polypropylene films by Helium-ion irradiation
- 2023Nanoscale thinning of metal-coated polypropylene films by Helium-ion irradiation
- 2022Post-degradation case study of the membrane electrode assembly from a low-temperature PEMFC stack
- 2022Post-degradation case study of the membrane electrode assembly from a low-temperature PEMFC stack
- 2022Insights into Degradation of the Membrane–Electrode Assembly Performance in Low-Temperature PEMFC:the Catalyst, the Ionomer, or the Interface?citations
- 2022Insights into Degradation of the Membrane–Electrode Assembly Performance in Low-Temperature PEMFCcitations
- 2020Out-of-plane surface patterning by subsurface processing of polymer substrates with focused ion beamscitations
- 2019Anomalous anisotropy in superconducting nanodiamond films induced by crystallite geometrycitations
- 2018FIB NANOPATTERNING OF METAL FILMS ON PMMA SUBSTRATES: NON-SPUTTERING MODE
- 2018Transition to Superwetting for a Nanostructured Surface
- 2018Transition to Superwetting for a Nanostructured Surface
- 2018Mapping the transition to superwetting state for nanotextured surfaces templated from block-copolymer self-assemblycitations
- 2018Mapping the transition to superwetting state for nanotextured surfaces templated from block-copolymer self-assemblycitations
- 2018Mapping the transition to superwetting state for nanotextured surfaces templated from block-copolymer self-assemblycitations
- 2017Helium Ion Microscopy of proton exchange membrane fuel cell electrode structurescitations
- 2017Helium Ion Microscopy of proton exchange membrane fuel cell electrode structurescitations
- 2016Challenges of fabricating plasmonic and photonic structures with Neon ion beam milling
- 2016Titanium Nitride as a Strain Gauge Materialcitations
- 2016Titanium Nitride as a Strain Gauge Materialcitations
Places of action
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conferencepaper
Challenges of fabricating plasmonic and photonic structures with Neon ion beam milling
Abstract
The unique properties of surface plasmons permitting subwavelength confinement of light, ultrafast propagation, and highly localized sensing are the key features for combining broadband optics and nanoscale electronics.Potential applications of plasmon-based devices span both nanoscale structures in future on-chip communication, processing and sensing, and macroscopic optical devices, such as polarizers and filters. <br/>For all these kind of devices a reliable technique to produce plasmonic structures with nanometer precision is required. So far fabrication has been mainly conducted with well-established electron beam lithography and focussed ion beam milling (FIB) using Gallium ions. These techniques, however, are to some extend limited in their resolution, and in addition Gallium and Carbon are implanted and deposited into the plasmonic structures during FIB process, potentially changing plasmonic properties.<br/>We are currently studying the capabilities of focussed Helium and Neon ion beam milling for the fabricating of plasmonic and photonic devices. We found that Neon ion beam milling enables us to prepare plasmonic structures, such as trenches (see Fig. 1) and V-grooves without doping and alloying effects specific to Galium FIB. Neon FIB milling is superior to Helium FIB milling in terms of the processing speed and smaller levels of implanted ions. From our perspective it is the most promising technique for the fabrication of individual plasmonic devices with a few nanometers precision.<br/>The main challenges of utilization of Ne FIB include: 1) Fabrication of metallic trenches with high depth/width aspect ratios. (such structures are predicted theoretically to have exceptional optical properties); 2)Low writing-speed in comparison to conventional electron beam lithography and Ga FIB milling.<br/>In our presentation we show the current progress in Neon FIB milling of plasmonic structures. We compare different materials, in particular poly- and mono-crystalline gold as well as thin films of Titanium Nitride, which are commonly used for plasmonic applications.