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Naji, M. |
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Motta, Antonella |
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Aletan, Dirar |
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Mohamed, Tarek |
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Ertürk, Emre |
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Taccardi, Nicola |
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Petrov, R. H. | Madrid |
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Kočí, Jan | Prague |
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Azam, Siraj |
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Blanpain, Bart |
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Ali, M. A. |
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Rančić, M. |
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Ollier, Nadège |
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Azevedo, Nuno Monteiro |
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Landes, Michael |
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Rignanese, Gian-Marco |
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Jones, Ian P.
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document
Microstructure and dielectric function modelling by spectroscopic ellipsometry and energy electron loss spectroscopy of In<sub>2</sub>O<sub>3</sub>:Sn thin films
Abstract
Indium tin oxide (ITO) is a semiconducting material combining high conductivity and high transparency in the visible range. It is the most widely used transparent conducting oxide in applications such as flat panel displays. In this work, ITO thin films were deposited by pulsed laser deposition (PLD) onto transparent glass substrates. The substrate temperature and oxygen pressure during deposition were controlled to generate a variety of microstructures and electro-optical properties. Similar film thicknesses were used to avoid any change of carrier concentration. The dielectric function and complex refractive index were derived using spectroscopic ellipsometry and electron energy loss spectroscopy.