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Naji, M. |
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Motta, Antonella |
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Aletan, Dirar |
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Mohamed, Tarek |
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Ertürk, Emre |
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Taccardi, Nicola |
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Kononenko, Denys |
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Petrov, R. H. | Madrid |
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Alshaaer, Mazen | Brussels |
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Bih, L. |
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Casati, R. |
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Muller, Hermance |
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Kočí, Jan | Prague |
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Šuljagić, Marija |
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Kalteremidou, Kalliopi-Artemi | Brussels |
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Azam, Siraj |
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Ospanova, Alyiya |
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Blanpain, Bart |
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Ali, M. A. |
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Popa, V. |
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Rančić, M. |
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Ollier, Nadège |
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Azevedo, Nuno Monteiro |
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Landes, Michael |
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Rignanese, Gian-Marco |
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Cui, Qingsong
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conferencepaper
Advanced CVD technology for emerging transition metal di-chalcogenides
Abstract
Transition metal di-chalcogenides (TMDCs) such as MoS2, MoSe2, WS2 and WSe2 have become a noteworthy complimentary material to graphene sharing many of its properties. They may however offer properties that are unattainable in graphene since TMDCs offer a tunable bandgap through both composition and number of layers. This has led to use of TMDCs in applications such as transistors, photodetectors, electroluminescent and bio-sensing devices. In addition, chalcogenide thin films such as CuInGaSe2 and CdTe have been commercialized for photovoltaic application, however the search for low cost, non-toxic and earth abundant high efficiency absorbing materials remains under investigation. Sn-S, a p-type semiconductor with a band gap of ~1.3 eV and the sort after aforementioned properties, has attracted great interest recently. Chemical vapour deposition (CVD) technology has the advantage of offering conformal, scalable, and controllable thin film growth on a variety of different substrates. In this talk we describe our recent development in TMDCs materials using CVD technology and discuss their potential applications.