• Krishnamurthi, Mahesh
• Sparks, Justin
• Gopalan, Venkatraman
• Baril, Neil F.
• Badding, John
• Sazio, Pier-John
• He, Rongrui

Abstract

The introduction of a crystalline semiconductor material within the capillaries of a microstructured optical fiber (MOF) presents tremendous potential for the development of in-fiber optoelectronic devices. We have developed a high-pressure microfluidic process that allows us to adapt traditional chemical vapor deposition chemistries to incorporate materials within the capillaries of MOFs. Pressures up to 35MPa are used to force a precursor/carrier gas mixture through the capillaries enabling deposition within microscale capillaries over meters in length. The materials can be organized within the MOFs for in-fiber applications, or the MOF can be used as a template for the formation of highly uniform extreme aspect ratio tubes and wires. Our efforts in the deposition of silicon carbide within the microscale capillaries of MOFs from a single source precursor will be presented. Crystalline semiconductor materials such as SiC are of particular interest to us owing to their ability to generate light. The introduction of SiC into the capillaries presents tremendous potential for the development of in-fiber optoelectronic devices with potential applications including light generation, modulation, and amplification.

Topics

• semiconductor
• carbide
• Silicon
• wire
• chemical vapor deposition