| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Christensen, Erik
Technical University of Denmark
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (20/20 displayed)
- 2022Pressurized solid phosphate electrolyzer for medium temperature water splittingcitations
- 2020CsH 2 PO 4 as Electrolyte for the Formation of CH 4 by Electrochemical Reduction of CO 2citations
- 2020CsH2PO4 as Electrolyte for the Formation of CH4 by Electrochemical Reduction of CO2citations
- 2016Zero-Gap Alkaline Water Electrolysis Using Ion-Solvating Polymer Electrolyte Membranes at Reduced KOH Concentrationscitations
- 2016Zero-Gap Alkaline Water Electrolysis Using Ion-Solvating Polymer Electrolyte Membranes at Reduced KOH Concentrationscitations
- 2015The effect of preparation method on the proton conductivity of indium doped tin pyrophosphatescitations
- 2014The Chemical Vapour Deposition of Tantalum - in long narrow channels
- 2014Intermediate Temperature Steam Electrolysis with Phosphate-Based Electrolytes
- 2014Invited: A Stability Study of Alkali Doped PBI Membranes for Alkaline Electrolyzer Cells
- 2013Development and Study of Tantalum and Niobium Carbides as Electrocatalyst Supports for the Oxygen Electrode for PEM Water Electrolysis at Elevated Temperaturescitations
- 2012WC as a non-platinum hydrogen evolution electrocatalyst for high temperature PEM water electrolyserscitations
- 2012Development of Refractory Ceramics for The Oxygen Evolution Reaction (OER) Electrocatalyst Support for Water Electrolysis at elevated temperaturescitations
- 2011Corrosion rate of construction materials in hot phosphoric acid with the contribution of anodic polarizationcitations
- 2011Corrosion behaviour of construction materials for high temperature steam electrolyserscitations
- 2011Corrosion behaviour of construction materials for high temperature steam electrolyserscitations
- 2011New Construction and Catalyst Support Materials for Water Electrolysis at Elevated Temperatures
- 2010Strategic surface topographies for enhanced lubrication in sheet forming of stainless steelcitations
- 2004Development of strategic surface topographies for lubrication in sheet forming of stainless steel
- 2000On the chemical nature of boundary lubrication of stainless steel by chlorine - and sulfur-containing EP-additivescitations
- 2000Cold Forging of Stainless Steel with FeCl3 based lubricants
Places of action
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thesis
The Chemical Vapour Deposition of Tantalum - in long narrow channels
Abstract
Tantalum’s resistance to corrosion in hot acidic environments and its superior metallic properties have made it a prime solution as a construction material or protective coating to equipment intended for use in such harsh chemical and physical conditions. The high price of tantalum metal limits its use as a construction material for process equipment, with the cheaper alternative being the construction of equipment from steel and then protecting it with a thin but efficacious layer of tantalum. Chemical Vapour Deposition (CVD) is chosen as the most effective process to apply thin corrosion protective layers of tantalum because of the process’ ability to coat complex geometries and its relative ease to control. This work focuses on studying the CVD of tantalum in long narrow channels with the view that the knowledge gained during the project can be used to optimise the commercial coating process that Tantaline A/S and Alfa Laval (Sweden) use to manufacture tantalum coated plate heat exchangers. Experiments are done by coating the inner side of long, thin stainless steel tubes in the temperature range of 700 – 950 °C and pressure range of 25 – 990 mbar while using different reactant concentrations in order to document the effects of these properties on the tantalum deposition rates. A kinetic model is developed upon the foundation of a Computational Fluid Dynamics (CFD) and Thermal model in order to broaden the understanding of the process and to identify the key control parameters. The developed model fits well at temperatures below 900 °C and the entire pressure range, but fails above 900 °C due to a change in reaction mechanism. Furthermore, Scanning Electron Microscope (SEM) imaging is used to show that the morphology of the deposited tantalum has a large dependence on temperature and that there is a major change in morphology between 850 – 900 °C. The effects of system pressure and precursor partial pressure are also studied, and were found to have relevance to the tantalum distribution along the substrates but little effect on the structural morphology of the deposited layer. In the implemented mechanism of reaction, TaCl3 is found to have a lot of relevance such that it is the main precursor to the surface reaction and that the overall deposition rates follow its abundance. An experiment with a real plate heat exchanger is also done and the corresponding model implemented with satisfactory results.