| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Astié, Vincent
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (6/6 displayed)
- 2024Determining by Raman spectroscopy the average thickness and N -layer-specific surface coverages of MoS 2 thin films with domains much smaller than the laser spot sizecitations
- 2024Optimizing YSZ Electrolyte Deposition via MOCVD for Enhanced Thin Film Solid Oxide Cells ; Optimisation de la déposition d'electrolyte de YSZ par MOCVD pour des cellules à oxydes solides en couche mince performantes
- 2024Integration of epitaxial LiNbO3 thin films with silicon technologycitations
- 2024Direct liquid injection pulsed-pressure MOCVD of large area MoS 2 on Si/SiO 2citations
- 2023Conductive TiN thin films grown by plasma- enhanced atomic layer deposition: Effects of N-sources and thermal treatmentscitations
- 2018Towards stoichiometric LiNbO3 epitaxial thin films grown by DLI-MOCVD
Places of action
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conferencepaper
Towards stoichiometric LiNbO3 epitaxial thin films grown by DLI-MOCVD
Abstract
Lithium Niobate (LiNbO3 or LN) is a ferroelectric compound that presents remarkable electro-optical, acoustical, pyroelectrical and ferroelectrical properties. As such, it was extensively studied and for a large variety of potential applications such as waveguides1, high frequency filters (RF)2 and ferroelectric memory (FRAM). However, this material in the form of thin films of controlled stoichiometry is still not available in industry. Direct liquid injection metalorganic chemical vapor deposition technique (DLI-MOCVD) was used to grow epitaxial LiNbO3 thin films on various substrates using tetramethylheptanedionate precursors, Li(thd) and Nb(thd)4. Epitaxial relationships are presented, and structural properties of the deposited films are investigated using X-ray diffraction (XRD) and scanning electron microscope (SEM) techniques. As lithium non-stoichiometry in LiNbO3 films is a critical parameter defining high acoustical/optical performance, lithium incorporation in the films was studied in details by varying deposition conditions. Li concentration in the films was estimated by means of Raman spectroscopy.