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Naji, M. |
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Motta, Antonella |
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Aletan, Dirar |
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Mohamed, Tarek |
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Ertürk, Emre |
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Taccardi, Nicola |
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Kononenko, Denys |
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Petrov, R. H. | Madrid |
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Alshaaer, Mazen | Brussels |
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Bih, L. |
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Casati, R. |
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Muller, Hermance |
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Kočí, Jan | Prague |
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Šuljagić, Marija |
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Kalteremidou, Kalliopi-Artemi | Brussels |
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Azam, Siraj |
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Ospanova, Alyiya |
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Blanpain, Bart |
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Ali, M. A. |
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Popa, V. |
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Rančić, M. |
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Ollier, Nadège |
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Azevedo, Nuno Monteiro |
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Landes, Michael |
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Rignanese, Gian-Marco |
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Scheul, Tudor
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Publications (4/4 displayed)
- 2022Light scattering from black silicon surfaces and its benefits for encapsulated solar cellscitations
- 2020Optoelectronic properties of ultrathin ALD silicon nitride and its potential as a hole-selective nanolayer for high efficiency solar cellscitations
- 2019Characterization of atomic layer deposited alumina thin films on black silicon textures using helium ion microscopycitations
- 2018Metal-assisted chemically etched black silicon for crystalline silicon solar cells
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document
Metal-assisted chemically etched black silicon for crystalline silicon solar cells
Abstract
Nanoscale textured silicon has the potential to overcome the optical challenges faced in the photovoltaic (PV) industry that remain in maximisation of photo-generation. However, due to the high aspect ratio of these structures, the electrical losses remain a huge challenge for this type of architecture. In this work, we use a Metal Assisted Chemical Etch (MACE) process to fabricate black silicon and analyse the influence on morphology of etch time and silver nitrate concentration. Furthermore, we show good surface passivation of the nanostructures using atomic layer deposition of AlOx, and study the optical influence of dual-passivation stacks using ultra-thin oxides.