| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Milčius, Darius
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (29/29 displayed)
- 2022On the structure of SbTeIcitations
- 2020Superhydrophilic functionalized graphene/fiberglass/epoxy laminates with high mechanical, impact and thermal performance and treated by plasmacitations
- 2019Black carbon-doped TiO2 films : synthesis, characterization and photocatalysiscitations
- 2018A new method of nanocrystalline nickel powder formation by magnetron sputtering on the water-soluble substratescitations
- 2017Hydrogen generation based on aluminum-water reaction for fuel cell applicationscitations
- 2017Stannate increases hydrogen evolution overpotential on rechargeable alkaline iron electrodescitations
- 2017Generation of hydrogen by the reaction between plasma modified aluminium and watercitations
- 2014Reaction of aluminum with water to produce hydrogen
- 2013The investigation of e-beam deposited titanium dioxide and calcium titanate thin filmscitations
- 2012Synthesis and characterization of multilayered GDC and SDC thin films deposited by e-beam technique
- 2012Substrate effects on formation and hydrogenation of Mg-Ni filmscitations
- 2011Scandium stabilized zirconium thin films formation by e-beam techniquecitations
- 2011The properties of scandium and cerium stabilized zirconium thin films formed by e-beam techniquecitations
- 2011Synthesis and characterization of GDC solid electrolytes obtained by solid state sintering of multilayer thin filmscitations
- 2011Influence of initial powder particle size on yttrium stabilized zirconium thin films formed by e-beam techniquecitations
- 2010A mechanically switchable metal-insulator transition in Mg2NiH4 discovers a strain sensitive, nanoscale modulated resistivity connected to a stacking faultcitations
- 2010The properties of gadolinium doped cerium oxide thin films formed evaporating nanopowder ceramic
- 2010Synthesis of gadolinium doped ceria solid electrolyte by solid state reactions of CeO2/Gd2O3 multilayer thin films
- 2009Porosity evaluation of TiO2 thin films deposited using pulsed DC-magnetron sputtering
- 2009The effects of dynamic structural transformations on hydrogenation properties of Mg and MgNi thin filmscitations
- 2009Titanium oxide thin films synthesis by pulsed – DC magnetron sputteringcitations
- 2009The properties of samarium doped ceria oxide thin films grown by e-beam deposition techniquecitations
- 2008Hydrogen storage in Mg-based nanocrystalline metal hydrides
- 2008Reactive pulsed - dc magnetron sputtering of Cr2O3 thin films
- 2007Failure analysis by indentation test of electrodeposited nanocrystalline CO-W and FE-W thin films
- 2007Influence of ion irradiation effects on the hydriding behavior of nanocrystalline Mg–Ni filmscitations
- 2007Formation of gadolinium doped ceria oxide thin films by electron beam deposition
- 2005Hydrogen storage in the bubbles formed by high-flux ion implantation in thin Al filmscitations
- 2005Synthesis of Mg(AlH4)(2) in bilayer Mg/Al thin films under plasma immersion hydrogen ion implantation and thermal desorption processescitations
Places of action
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article
Reactive pulsed - dc magnetron sputtering of Cr2O3 thin films
Abstract
Oxide materials with high proton conductivity (because of their high selectivity of hydrogen) are good candidates for hydrogen) separation membranes. One of the candidates for proton conductivity is corundum type chromium oxide thin films. The chromium oxide thin films could be formed by different techniques. The pulsed - dc magnetron sputtering is one of the chromium oxide thin films synthesis techniques, which is versatile and more effective than other magnetron sputtering techniques. The main requirement for chromium oxide thin films used for hydrogen separation is dense microstructure and stoichiometry. The influence of pulsed DC sputtering technological parameters (oxygen partial pressure, the distance between the substrate, and the magnetron cathode) on the properties of formed chromium oxide thin films were investigated in this work. The oxygen pressure was changed form 2 Pa to 16 Pa and the distance of the substrate to the magnetron cathode - from 3 cm to 5 cm. Chromium oxide thin films were characterized by X-ray diffraction (XRD), scanning electron microscope (SEM), energy dispersive X-ray (EDX), and elipsometer.Thin films of chromium oxide were deposited onto Alloy- 600 (Ni, Cr, Fe, Mo and Co alloy), Hastelloy-X, quartz, and silicon substrates. The formed chromium oxide thin films showed an amorphous structure. The polycrystalline structure was obtained when the distance of the Substrate to the magnetron cathode was 3 cm. Cross sections of synthesized chromium oxide thin films show that they grow with Columnar structure.