| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Laukaitis, Giedrius
Kaunas University of Technology
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (14/14 displayed)
- 2022Properties on Yttrium-Doped/Undoped Barium Cerate and Barium Zirconate Thin Films Formed by E-Beam Vapor Deposition
- 2021Properties of Barium Cerate-Zirconate Thin Filmscitations
- 2013The investigation of e-beam deposited titanium dioxide and calcium titanate thin filmscitations
- 2012Synthesis and characterization of multilayered GDC and SDC thin films deposited by e-beam technique
- 2011Scandium stabilized zirconium thin films formation by e-beam techniquecitations
- 2011The properties of scandium and cerium stabilized zirconium thin films formed by e-beam techniquecitations
- 2011Synthesis and characterization of GDC solid electrolytes obtained by solid state sintering of multilayer thin filmscitations
- 2011Influence of initial powder particle size on yttrium stabilized zirconium thin films formed by e-beam techniquecitations
- 2010The properties of gadolinium doped cerium oxide thin films formed evaporating nanopowder ceramic
- 2009Porosity evaluation of TiO2 thin films deposited using pulsed DC-magnetron sputtering
- 2009Titanium oxide thin films synthesis by pulsed – DC magnetron sputteringcitations
- 2009The properties of samarium doped ceria oxide thin films grown by e-beam deposition techniquecitations
- 2008Reactive pulsed - dc magnetron sputtering of Cr2O3 thin films
- 2007Formation of gadolinium doped ceria oxide thin films by electron beam deposition
Places of action
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article
Reactive pulsed - dc magnetron sputtering of Cr2O3 thin films
Abstract
Oxide materials with high proton conductivity (because of their high selectivity of hydrogen) are good candidates for hydrogen) separation membranes. One of the candidates for proton conductivity is corundum type chromium oxide thin films. The chromium oxide thin films could be formed by different techniques. The pulsed - dc magnetron sputtering is one of the chromium oxide thin films synthesis techniques, which is versatile and more effective than other magnetron sputtering techniques. The main requirement for chromium oxide thin films used for hydrogen separation is dense microstructure and stoichiometry. The influence of pulsed DC sputtering technological parameters (oxygen partial pressure, the distance between the substrate, and the magnetron cathode) on the properties of formed chromium oxide thin films were investigated in this work. The oxygen pressure was changed form 2 Pa to 16 Pa and the distance of the substrate to the magnetron cathode - from 3 cm to 5 cm. Chromium oxide thin films were characterized by X-ray diffraction (XRD), scanning electron microscope (SEM), energy dispersive X-ray (EDX), and elipsometer.Thin films of chromium oxide were deposited onto Alloy- 600 (Ni, Cr, Fe, Mo and Co alloy), Hastelloy-X, quartz, and silicon substrates. The formed chromium oxide thin films showed an amorphous structure. The polycrystalline structure was obtained when the distance of the Substrate to the magnetron cathode was 3 cm. Cross sections of synthesized chromium oxide thin films show that they grow with Columnar structure.