• Duck, Benjamin
• Element, Adrian
• Li, Yong
• Anderson, Kenrick

Abstract

Organic-inorganic halide perovskite materials have garnered significant attention in recent years due to their easy material fabrication, outstanding optoelectronic properties, and remarkable defect tolerance. [1] While high-performance perovskite materials find applications not only in photovoltaics [2] but also in light-emitting diodes (LEDs), transistors, lasers, and various other optoelectronic devices [3], most of these devices have been traditionally fabricated using solution-processed spin-coating methods, limited to small areas. Vacuum deposition methods, although providing better scalability, demand expensive high vacuum systems and suffer from slow deposition rates. In contrast, chemical vapor deposition (CVD) emerges as a more straightforward, cost-effective, and solvent-free technique that offers excellent conformality and scalability. [4-5]In our study, we have designed a novel low vacuum CVD reaction system to fabricate large area perovskite thin films. The setup includes separate temperature controls for organic materials and three different sublimation heads for MAI/MABr, FAI/FABr, or MACl sublimations, with a hot plate beneath for precise control of the distance between the sublimation heads and substrates, as well as the CVD hotplate reaction temperatures.

Topics

• perovskite
• thin film
• defect
• chemical vapor deposition
• coating method