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Naji, M. |
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Motta, Antonella |
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Aletan, Dirar |
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Mohamed, Tarek |
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Ertürk, Emre |
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Taccardi, Nicola |
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Kononenko, Denys |
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Petrov, R. H. | Madrid |
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Alshaaer, Mazen | Brussels |
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Bih, L. |
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Casati, R. |
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Muller, Hermance |
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Kočí, Jan | Prague |
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Šuljagić, Marija |
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Kalteremidou, Kalliopi-Artemi | Brussels |
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Azam, Siraj |
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Ospanova, Alyiya |
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Blanpain, Bart |
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Ali, M. A. |
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Popa, V. |
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Rančić, M. |
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Ollier, Nadège |
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Azevedo, Nuno Monteiro |
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Landes, Michael |
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Rignanese, Gian-Marco |
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Thomas, Shibin
University of Southampton
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (12/12 displayed)
- 2024Electrodeposition of 2D layered tungsten diselenide thin films using a single source precursorcitations
- 20222D material based optoelectronics by electroplating
- 20222D material based optoelectronics by electroplating
- 2021Electrodeposited WS 2 monolayers on patterned graphenecitations
- 2021Tungsten disulfide thin films via electrodeposition from a single source precursorcitations
- 2021Lateral growth of MoS2 2D material semiconductors over an insulator via electrodepositioncitations
- 2021Lateral growth of MoS 2 2D material semiconductors over an insulator via electrodepositioncitations
- 2020Large-area electrodeposition of few-layer MoS2 on graphene for 2D material heterostructurescitations
- 2020Large-area electrodeposition of few-layer MoS 2 on graphene for 2D material heterostructurescitations
- 2020Electrodeposition of MoS2 from dichloromethanecitations
- 2018Single step electrodeposition process using ionic liquid to grow highly luminescent silicon/rare earth (Er, Tb) thin films with tunable compositioncitations
- 2018Role of electrochemical process parameters on the electrodeposition of silicon from 1-butyl-1-methylpyrrolidinium bis(trifluoromethanesulfonyl)imide ionic liquidcitations
Places of action
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document
2D material based optoelectronics by electroplating
Abstract
Developing scalable techniques for growing transition metal dichalcogenides (TMDCs) 2D materials is a major challenge that needs to be overcome before these materials can make an impact on the (opto-) electronic industry. Electroplating (electrodeposition) is an industrially acceptable deposition technique that has unique advantages. In this work, we present a novel electrode design that enable MoS2 to be grown laterally over an insulator. Photodetector devices were developed based on electrodeposited TMDCs. We will then present vertical growth of large area and micropatterned MoS2 and WS2 monolayers on graphene electrodes. These results demonstrate that electrodeposition is an attractive method for producing device quality 2D materials which can be scaled to wafer sizes for fabrication industries.