| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Cormier, Pierre-Antoine
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (12/12 displayed)
- 2019Energy flux measurements during magnetron sputter deposition processescitations
- 2018Can the normalized energy flux at the substrate control the microstructure of reactively sputtered TiO2 thin films ?
- 2015Deposition of porous titanium oxide thin films as anode material for dye sensitized solar cells
- 2014Titanium oxide thin film growth by magnetron sputtering: Total energy flux and its relationship with the phase constitutioncitations
- 2013ZnO-Ag composite by reactive magnetron co-sputtering: structural and morphological characterisation
- 2013Energy transferred to the substrate surface during reactive magnetron sputtering of aluminum in Ar/O2 atmospherecitations
- 2013Energy flux measurements at the substrate position during reactive and non reactive magnetron sputter deposition processes
- 2013IR emission from the target during plasma magnetron sputter deposition
- 2013IR emission from the target during plasma magnetron sputter depositioncitations
- 2013Energy flux measurements at the substrate deposition during reactive and non-reactive magnetron sputter deposition processes
- 2013ZnO-Ag composite by reactive magnetron co-sputtering: structural and morphological characterisations
- 2012Study of the energy flux during plasma/surface interaction
Places of action
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thesis
Study of the energy flux during plasma/surface interaction
Abstract
The knowledge of the energy flux during plasma/surface interactions is a key parameter for the control of low pressure plasmas, as sputter deposition or etching processes. The energy flux density at a surface depends on plasma species (ions, electrons, neutrals...) elementary processes (condensation, chemical reaction, radiative transfer). It can be obtained by carring out simulation of particule transport through the plasma, by the calculation of each energetic contribution from plasma parameters or by indirect or direct measurement. Most os works focused on the mesurement of the energy flux is based on the using of a calorimetric probe. This method is based on the calculation of the temporal temperature evolution. The main disadvantages are that this methods can cause error of about 10 % and the acquisition time of the thermogram which is about 2 min. A diagnostic tool which provide a direct measurement of the energy flux, with a good sensitivity and a good time resolution was designed in the GREMI.The aim of this PhD thesis was to developped this tool and use for the study of different plasma processes as capacitiv RF discharge, Hall effect plasma thruster and especially magnetron sputter deposition process. In this last process, the influence of the cathode magnetic configuration, the reactive gas, the dicharge type (HiPIMS, DCMS and pDCMS), the heating of the target was studied on the energy flux at the growing thin film duting the sputtering of a titanium and an aluminum target.