• Baumbach, T.
• Mangold, S.
• Krause, Bärbel
• Doyle, S.
• Stüber, M.
• Ulrich, S.
• Darma, S.

Abstract

Contribution submission to the conference Berlin 2012of sputter-deposited V-Al-C-N coatings — Susan Darma1 ,TechnologieMulti-element hard coating materials such as V-Al-C-N are of great interest for many technological applications. Their mechanical propertiesdepend on the composition and microstructure of the coating. In orderto determine the optimum composition and deposition conditions ofthese complex materials, many samples are required. One powerful toolfor reducing the number of experiments is based on the so-called combinatorial approach for thin film deposition: many different thin filmsamples can be realized simultaneously, exploiting the deposition gradient resulting from codeposition of several materials. We will present anX-ray diffraction study of the influence of the deposition geometry onthe microstructure of V-Al-C-N coatings. The films were deposited byreactive RF magnetron sputtering from a segmented target composedof AlN and VC. Synchrotron radiation measurements where performedat the beamline PDIFF at ANKA. Significant texture changes were observed which can be attributed to the deposition geometry, as verifiedby calculations of the flux distribution. We conclude that codepositioncan accelerate significantly the screening of new materials, under thecondition that the desired property is not significantly influenced bythe microstructural changes due to the deposition geometry.Part:Type:Topic:Email:DSPosterThin Film Characterisation: StructureAnalysis and Composition (XRD, TEM,XPS, SIMS, RBS, ...)

Topics

• Deposition
• impedance spectroscopy
• microstructure
• x-ray diffraction
• experiment
• thin film
• x-ray photoelectron spectroscopy
• transmission electron microscopy
• texture
• selective ion monitoring
• Rutherford backscattering spectrometry