| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Kiazadeh, Asal
Universidade Nova de Lisboa
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (15/15 displayed)
- 2024Printed Memristors: An Overview of Ink, Materials, Deposition Techniques, and Applicationscitations
- 2024Inkjet printed IGZO memristors with volatile and non-volatile switchingcitations
- 2021Towards Sustainable Crossbar Artificial Synapses with Zinc-Tin Oxidecitations
- 2021Towards Sustainable Crossbar Artificial Synapses with Zinc-Tin Oxidecitations
- 20202D Resistive Switching Based on Amorphous Zinc–Tin Oxide Schottky Diodescitations
- 2019Electrochemical metallization ReRAMs (ECM) - Experiments and modellingcitations
- 2019Flexible and transparent ReRAM devices for system on panel (SOP) applicationcitations
- 2017Memristors using solution-based IGZO nanoparticlescitations
- 2017Memristors Using Solution-Based IGZO Nanoparticlescitations
- 2016Improving positive and negative bias illumination stress stability in parylene passivated IGZO transistorscitations
- 2016UV-Mediated Photochemical Treatment for Low-Temperature Oxide-Based Thin-Film Transistorscitations
- 2016FUV-assisted low temperature AlOx solution based dielectric for oxide TFTs
- 2016Substrate reactivity as the origin of Fermi level pinning at the Cu2O/ALD-Al2O3 interfacecitations
- 2013Fabrication and characterization of memory devices based on nanoparticles
- 2012Electroforming process in metal-oxide-polymer resistive switching memories
Places of action
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document
FUV-assisted low temperature AlOx solution based dielectric for oxide TFTs
Abstract
Solution processing of amorphous metal oxides has been lately used as an option to implement in flexible electronics allowing a reduction of the associated costs and increased performance. However the research has focused more on semiconductor layer rather than on the insulator layer that is related to the stability andperformance of the devices.<br/>This work aims to evaluate amorphous aluminum oxide thin films produced by combustion synthesis and the influence of far ultraviolet (FUV) irradiation on properties of the insulator on thin film transistors (TFTs) using different semiconductors, in order to have compatibility with flexible substrates. [1–3] Optimized dielectric layer was obtained for an annealing of 30 minutes assisted by FUV exposure.