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Rouessac, Vincent
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Publications (6/6 displayed)
- 2021In- and out-plane transport properties of chemical vapor deposited TiO2 anatase filmscitations
- 2020Sorption and permeation of water through Plasma Enhanced Chemical Vapour Deposited phosphonic acid-based membranescitations
- 2019Effect of plasma power on the semiconducting behavior of low-frequency PECVD TiO2 and nitrogen-doped TiO2 anodic thin coatings: photo-electrochemical studies in a single compartment cell for hydrogen generation by solar water splittingcitations
- 2016Impact of plasma reactive ion etching on low dielectric constant porous organosilicate films’ microstructure and chemical compositioncitations
- 2006Porosity of supported thin films and membranes studied by ellipsometric porosimetry
- 2002In-situ Mass Spectrometry analyses of the fragmentation of linear and cyclic siloxanes in a glow discharge compared with ex-situ FTIR analyses of the deposits
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article
In-situ Mass Spectrometry analyses of the fragmentation of linear and cyclic siloxanes in a glow discharge compared with ex-situ FTIR analyses of the deposits
Abstract
Mass Spectrometry (MS) analyses, up to 300 amu, were performed on linear hexamethyldisiloxane (HMDSO) and cyclic octamethylcyclotetrasiloxane (OMCTSO) vapors in low frequency plasmas (40 kHz). The fragmentation rates of the precursors, and possible oligomerization in the gas phase, depend on the plasma power. Two extreme plasma power conditions were compared: a high plasma power density and a low plasma power density, corresponding to silica-like and polymer-like film deposition conditions, respectively. The results of ex-situ Fourier transform infrared spectroscopy (FTIR) analyses can be explained by the plasma composition analyzed by MS.