| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Borderon, Caroline
Nantes Université
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (24/24 displayed)
- 2022Crystallographic orientation dependence of ferroelectric domain walls in antiferroelectric lead zirconate thin filmscitations
- 2021Characterization and Performance Analysis of BST-Based Ferroelectric Varactors in the Millimeter-Wave Domaincitations
- 2020Effect of ferroelectric domain walls on the dielectric properties of PbZrO3 thin filmscitations
- 2017Effect of the incident power on permittivity, losses and tunability of BaSrTiO<sub>3</sub> thin films in the microwave frequency rangecitations
- 2017Effect of the incident power on permittivity, losses and tunability of BaSrTiO 3 thin films in the microwave frequency rangecitations
- 2016Domain wall motions in BST ferroelectric thin films in the microwave frequency rangecitations
- 2016Description of domain wall motions by the hyperbolic law
- 2016Decomposition of the different contributions to permittivity, losses, and tunability in BaSrTiO3 thin films using the hyperbolic lawcitations
- 2015Effect of Manganese Doping of BaSrTiO 3 on Diffusion and Domain Wall Pinningcitations
- 2015Temperature stable BaSrTiO3 thin films suitable for microwave applicationscitations
- 2014Dielectric long time relaxation of domains walls in PbZrTiO3 thin filmscitations
- 2014Electrophoretic deposition of BaTiO3 thin films from stable colloidal aqueous solutionscitations
- 2013A new method of dielectric characterization in the microwave range for high-k ferroelectric thin filmscitations
- 2012Miniaturized and Reconfigurable Notch Antennas Using a BST Thin Film Varactor
- 2011Wet chemical etching of BaSrTiO3 ferroelectric thin films for intelligent antenna application
- 2011The effect of Mn doping on the dielectric properties and domain wall mobility of (Ba0.8Sr0.2)TiO3 thin films
- 2011Ferroelectric thin films for mobile communication applications
- 2011Measurement and Modeling of Dielectric Properties of Pb(Zr,Ti)O-3 Ferroelectric Thin Filmscitations
- 2011Dielectric properties of PZT thin films under a low AC-electric field at different bias fields
- 2011Description of the low field nonlinear dielectric properties of ferroelectric and multiferroic materialscitations
- 2010Measurement and modelisation of dielectric properties of ferroelectrics thin layers
- 2010Description of the nonlinear dielectric properties of ferroelectrics under a weak AC-fieldcitations
- 2008Preparation and characterization of barium strontium titanate thin films by chemical solution depositioncitations
- 2008Influence of the morphology of Barium Strontium Titanate thin films on the ferroelectric and dielectric propertiescitations
Places of action
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document
Wet chemical etching of BaSrTiO3 ferroelectric thin films for intelligent antenna application
Abstract
Due to its high tunable permittivity and low dielectric losses, (Ba1-xSrx)TiO3 (BST) thin films appear to be one of the most studied candidates among ferroelectric materials for the realization of intelligent microelectronics components. BST material’s high-k property and tunability may particularly serve for the conception of innovative antenna devices designed for miniaturization and functionalizing of embarked telecommunication systems. In the present work, wet chemical BST etching is investigated, allowing a cheap, easy and precise integration of the ferroelectric thin film. The etchant is prepared from buffered hydrofluoric acid (BHF) and nitric acid (HNO3) which respectively act as the reactive and the catalysis component.