| People | Locations | Statistics |
|---|---|---|
| Naji, M. |
| |
| Motta, Antonella |
| |
| Aletan, Dirar |
| |
| Mohamed, Tarek |
| |
| Ertürk, Emre |
| |
| Taccardi, Nicola |
| |
| Kononenko, Denys |
| |
| Petrov, R. H. | Madrid |
|
| Alshaaer, Mazen | Brussels |
|
| Bih, L. |
| |
| Casati, R. |
| |
| Muller, Hermance |
| |
| Kočí, Jan | Prague |
|
| Šuljagić, Marija |
| |
| Kalteremidou, Kalliopi-Artemi | Brussels |
|
| Azam, Siraj |
| |
| Ospanova, Alyiya |
| |
| Blanpain, Bart |
| |
| Ali, M. A. |
| |
| Popa, V. |
| |
| Rančić, M. |
| |
| Ollier, Nadège |
| |
| Azevedo, Nuno Monteiro |
| |
| Landes, Michael |
| |
| Rignanese, Gian-Marco |
|
Saari, Jesse
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (16/16 displayed)
- 2024Ti3+ Self-Doping-Mediated Optimization of TiO2 Photocatalyst Coating Grown by Atomic Layer Depositioncitations
- 2023Is Carrier Mobility a Limiting Factor for Charge Transfer in Tio2/Si Devices? A Study by Transient Reflectance Spectroscopycitations
- 2022Insights into Tailoring of Atomic Layer Deposition Grown TiO2 as Photoelectrode Coating
- 2022Low-Temperature Route to Direct Amorphous to Rutile Crystallization of TiO2Thin Films Grown by Atomic Layer Depositioncitations
- 2022Tunable Ti3+-Mediated Charge Carrier Dynamics of Atomic Layer Deposition-Grown Amorphous TiO2citations
- 2021Interface Engineering of TiO2 Photoelectrode Coatings Grown by Atomic Layer Deposition on Siliconcitations
- 2020Optimization of photogenerated charge carrier lifetimes in ald grown tio2 for photonic applicationscitations
- 2019Defect engineering of atomic layer deposited TiO2 for photocatalytic applications
- 2019Diversity of TiO2: Controlling the molecular and electronic structure of atomic layer deposited black TiO2citations
- 2018Fabrication of topographically microstructured titanium silicide interface for advanced photonic applicationscitations
- 2018Role of Oxide Defects in ALD grown TiO2 Coatings on Performance as Photoanode Protection Layer
- 2018Improved Stability of Atomic Layer Deposited Amorphous TiO2 Photoelectrode Coatings by Thermally Induced Oxygen Defectscitations
- 2017Role of Oxide Defects in ALD grown TiO2 Coatings on Performance as Photoanode Protection Layer
- 2017Tailored Fabrication of Transferable and Hollow Weblike Titanium Dioxide Structurescitations
- 2017Tailored Fabrication of Transferable and Hollow Weblike Titanium Dioxide Structurescitations
- 2016Fabrication of topographically microstructured titanium silicide interface for advanced photonic applicationscitations
Places of action
| Organizations | Location | People |
|---|
document
Role of Oxide Defects in ALD grown TiO2 Coatings on Performance as Photoanode Protection Layer
Abstract
Photoelectrochemical (PEC) water splitting is one of the potential methods of utilizing solar energy. A major issue for the method and for renewable energy production is the development of an efficient, chemically stable and cost-effective semiconductor photoanode. Recently, titanium dioxide (TiO<sub>2</sub>) coatings grown by atomic layer deposition (ALD) have appeared to be a promising approach to stabilize semiconductor photoanodes under PEC conditions. In particular, amorphous ALD grown TiO<sub>2</sub> has shown exceptional charge transfer properties compared to its crystalline form that are not properly understood yet. Therefore, we target to gain better understanding on the defect structure of ALD grown TiO<sub>2</sub> and utilize the information in the development of optimal photoanode protection layer for efficient solar water splitting.<br/><br/>In this work, structural, optical and photoelectrochemical properties of the ALD grown TiO<sub>2</sub> films were studied in as-deposited condition and after annealing in air at 500 °C. TiO<sub>2</sub> films were grown on n-type phosphorus-doped silicon and fused quartz by ALD at 200 °C using tetrakis(dimethylamido)titanium (TDMAT) and deionized water as precursors. The properties of TiO<sub>2</sub> were investigated by X-ray photoelectron spectroscopy (XPS), ellipsometry and UV/Vis/NIR spectrophotometry. In addition, results from X-ray diffraction (XRD), Raman spectroscopy and photoelectrochemical (PEC) cell are discussed.<br/><br/>Based on the results, as-deposited TiO<sub>2</sub> is amorphous and absorbs visible light as ''black'' TiO<sub>2</sub>. After annealing in air at 500 °C TiO<sub>2</sub> crystallizes as rutile and becomes ''white'' TiO<sub>2</sub> that absorbs light only in the UV region. As-deposited TiO<sub>2</sub> contains significant amount of Ti<sup>3+/2+</sup> oxygen vacancies that are oxidized as Ti<sup>4+</sup> upon annealing in air. In addition, nitrogen is found only in as-deposited titanium dioxide. As-deposited TiO<sub>2</sub> is not chemically stable under PEC conditions. In contrast, the annealed TiO<sub>2</sub> is chemically stable and showed 0.20 % ABPE efficiency for water splitting reaction.<br/><br/>As a conclusion, Ti<sup>3+</sup> defects induce photocorrosion of ALD TiO<sub>2</sub> under PEC conditions. After annealing in air at 500 °C ALD TiO<sub>2</sub> is chemically stable and it can be used as a photoanode protection layer. In the future, research will be focused on optimizing the properties of ALD TiO<sub>2</sub>/Si interface and studying the structure of the surface after deposition of nickel electrocatalysts on TiO<sub>2</sub>/Si photoanode.<br/>